Invention Grant
- Patent Title: Advanced load port for photolithography mask inspection tool
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Application No.: US18429281Application Date: 2024-01-31
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Publication No.: US12298664B2Publication Date: 2025-05-13
- Inventor: Tung-Jung Chang , Jen-Yang Chung , Han-Lung Chang
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F1/66 ; G03F1/84

Abstract:
A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.
Public/Granted literature
- US20240168387A1 ADVANCED LOAD PORT FOR PHOTOLITHOGRAPHY MASK INSPECTION TOOL Public/Granted day:2024-05-23
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