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公开(公告)号：US11467498B2
公开(公告)日：2022-10-11
申请号：US17222109
申请日：2021-04-05
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Jen-Yang Chung , Chieh Hsieh , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
Abstract: A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.
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公开(公告)号：US12298664B2
公开(公告)日：2025-05-13
申请号：US18429281
申请日：2024-01-31
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tung-Jung Chang , Jen-Yang Chung , Han-Lung Chang
Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.
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公开(公告)号：US10162277B2
公开(公告)日：2018-12-25
申请号：US15800215
申请日：2017-11-01
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Shang-Chieh Chien , Jye-Fu Jeng , Shih-Chang Shih , Kun-Jin Wu , Guan-Heng Liu , Jen-Yang Chung , Li-Jui Chen , Po-Chung Cheng
Abstract: An extreme ultraviolet (EUV) lithography system includes a collector designed to collect and reflect EUV radiation, a cover integrated with the collector, a first exhaust line connected to the cover and configured to receive debris vapor from the collector, a debris trapper connected to the first exhaust line and configured to trap the debris vapor, and a second exhaust line connected to the debris trapper.
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公开(公告)号：US11921431B2
公开(公告)日：2024-03-05
申请号：US18161433
申请日：2023-01-30
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tung-Jung Chang , Jen-Yang Chung , Han-Lung Chang
CPC classification number: G03F7/70608 , G03F1/66 , G03F1/84 , G03F7/70741
Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.
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Patent Agency Ranking
公开(公告)号：US11592754B2
公开(公告)日：2023-02-28
申请号：US17478300
申请日：2021-09-17
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Tung-Jung Chang , Jen-Yang Chung , Han-Lung Chang
Abstract: A method and a system for inspecting an extreme ultra violet mask and a mask pod for such masks is provided. An EUV mask inspection tool inspects a mask retrieved from a mask pod placed on the load port positioned exterior of the mask inspection tool. The inspection process is performed during a selected period of time. After the inspection process is initiated, a robotic handling mechanism such as a robotic arm or an AMHS picks up the mask pod and inspects the mask pod for foreign particles. A mask pod inspection tool determines whether the mask pod needs cleaning or replacing based on a selected swap criteria. The mask pod is retrieved from the mask pod inspection tool and placed on the load port before the selected period of time lapses. This method and system promotes a reduction in the overall time required for inspecting the mask and the mask pod.
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公开(公告)号：US11272606B2
公开(公告)日：2022-03-08
申请号：US15801225
申请日：2017-11-01
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Shang-Chieh Chien , Po-Chung Cheng , Chia-Chen Chen , Jen-Yang Chung , Li-Jui Chen , Tzung-Chi Fu , Shang-Ying Wu
Abstract: An extreme ultra violet (EUV) radiation source apparatus includes a collector, a target droplet generator for generating a tin (Sn) droplet, a rotatable debris collection device and a chamber enclosing at least the collector and the rotatable debris collection device. The rotatable debris collection device includes a first end support, a second end support and a plurality of vanes, ends of which are supported by the first end support and the second end support, respectively. A surface of at least one of the plurality of vanes is coated by a catalytic layer, which reduces a SnH4 to Sn.
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公开(公告)号：US11237482B2
公开(公告)日：2022-02-01
申请号：US16195945
申请日：2018-11-20
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Chao-Chen Chang , Shao-Wei Luo , Jen-Yang Chung , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
Abstract: A device is disclosed that includes a master controller, a process chamber, a local controller, a switch, and a data storage. The process chamber is configured to generate a data according to a EUV light generation process. The local controller is coupled to the master controller and configured to control the process chamber. The switch is coupled between the master controller and the local controller, wherein the switch is configured to provide paths for the local controller to communicate with the master controller. The data storage directly connected to the local controller and configured to store the data. The local controller communicates directly with the data storage.
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公开(公告)号：US10969690B2
公开(公告)日：2021-04-06
申请号：US16029408
申请日：2018-07-06
Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
Inventor： Jen-Yang Chung , Chieh Hsieh , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
Abstract: A method of controlling a droplet illumination module/droplet detection module system of an extreme ultraviolet (EUV) radiation source includes irradiating a target droplet with light from a droplet illumination module and detecting light reflected and/or scattered by the target droplet. The method includes determining whether an intensity of the detected light is within an acceptable range. In response to determining that the intensity of the detected light is not within the acceptable range, a parameter of the droplet illumination module is automatically adjusted to set the intensity of the detected light within the acceptable range.
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公开(公告)号：US10274844B1
公开(公告)日：2019-04-30
申请号：US15821932
申请日：2017-11-24
Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
Inventor： Jen-Yang Chung , Chieh Hsieh , Shang-Chieh Chien , Li-Jui Chen , Po-Chung Cheng
Abstract: A lithography apparatus is provided. The lithography apparatus includes a reticle stage. The reticle stage includes a main base, an electrostatic chuck and a safety protecting device. The electrostatic chuck is disposed on the main base and configured to generate an electrostatic force for holding a reticle. The safety protecting device is connected to the main base and is configured to generate a pushing force toward the reticle when the electrostatic force generated by the electrostatic chuck is interrupted.
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