- 专利标题: Semiconductor laser and method of manufacturing the same
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申请号: US10044979申请日: 2002-01-15
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公开(公告)号: US20020094677A1公开(公告)日: 2002-07-18
- 发明人: Akira Furuya , Chikashi Anayama , Katsumi Sugiura , Kensei Nakao , Taro Hasegawa
- 申请人: Fujitsu Quantum Devices Limited
- 申请人地址: JP Nakakoma-gun
- 专利权人: Fujitsu Quantum Devices Limited
- 当前专利权人: Fujitsu Quantum Devices Limited
- 当前专利权人地址: JP Nakakoma-gun
- 优先权: JP2001-010427 20010118
- 主分类号: H01L021/44
- IPC分类号: H01L021/44
摘要:
In the S3-type semiconductor laser, when an angle of a first growth profile line to the first principal plane, the first growth profile line connecting respective lower side lines of an upper inclined plane and a lower inclined plane of the first layer of the first conduction type cladding layer is null1, an angle of a second growth profile line to the first principal plane, the second growth profile line connecting respective lower side lines of an upper inclined plane and a lower inclined plane of the second layer of the first conduction type cladding layer is null2, an angle of a third growth profile line to the first principal plane, the third growth profile line connecting respective lower side lines of an upper inclined plane and a lower inclined plane of the third layer of the first conduction type cladding layer is null3, and an angle of a fourth growth profile line to the first principal plane, the fourth growth profile line connecting respective lower side lines of an upper inclined plane and a lower inclined plane of the fourth layer of the first conduction type cladding layer is null4, relationships null1 null3, null3
公开/授权文献
- US06501090B2 Semiconductor laser and method of manufacturing the same 公开/授权日:2002-12-31
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