Invention Application
US20020110648A1 Diamond film depositing apparatus and method thereof 失效
金刚石膜沉积设备及其方法

Diamond film depositing apparatus and method thereof
Abstract:
A diamond film depositing apparatus and method are disclosed in which a uniform and large plasma is formed on a substrate having a diameter of larger than 100 mm without using a heated filament cathode, without applying a magnetic field thereto, and without using a ballast resistance. The thusly formed plasma is maintained stably for a long time, so that a diamond thick film having a diameter of larger than 4 inches and a thickness of over hundreds of nullm can be deposited on a flat or curved substrate and also on a Si wafer.
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