Invention Application
US20020162419A1 High purity gallium for producing compound semiconductor, refining process and apparatus for the same
审中-公开
用于生产化合物半导体的高纯度镓,精炼工艺及其设备
- Patent Title: High purity gallium for producing compound semiconductor, refining process and apparatus for the same
- Patent Title (中): 用于生产化合物半导体的高纯度镓,精炼工艺及其设备
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Application No.: US10134381Application Date: 2002-04-30
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Publication No.: US20020162419A1Publication Date: 2002-11-07
- Inventor: Takeharu Yamamura , Hidekazu Kato , Takashi Ohgami , Kishio Tayama , Kanichi Okuda
- Applicant: DOWA MINING CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: DOWA MINING CO., LTD.
- Current Assignee: DOWA MINING CO., LTD.
- Current Assignee Address: JP Tokyo
- Priority: JP10-309144 19981029
- Main IPC: C22B007/04
- IPC: C22B007/04 ; C22C028/00 ; C22B058/00

Abstract:
In a process for separating impurities from a raw gallium material containing impurities, a process for refining gallium comprising progressively solidifying a raw gallium material provided in a liquid state inside a vessel while applying stirring, such that the diameter of the tubular solidification boundary gradually advances from the inner wall plane of the vessel towards the center of the vessel to reduce the diameter of the tubular solidification boundary, and separating the liquid phase remaining in the central portion of the vessel from the solidified phase before the entire raw material inside the vessel is solidified. The process above is repeated as required by using, as the raw gallium material, the solidified phase from which the liquid phase is separated. A metallic gallium favorably used for the preparation of a compound semiconductor can be obtained by analyzing the impurity concentration of the impurity-concentrated Ga separated from the solidified layer.
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