Invention Application
- Patent Title: Apparatus for cyclical deposition of thin films
- Patent Title (中): 用于薄膜循环沉积的装置
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Application No.: US10352257Application Date: 2003-01-27
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Publication No.: US20030172872A1Publication Date: 2003-09-18
- Inventor: Randhir P.S. Thakur , Alfred W. Mak , Ming Xi , Walter Benjamin Glenn , Ahmad A. Khan , Ayad A. Al-Shaikh , Avgerinos V. Gelatos , Salvador P. Umotoy
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: null
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: null
- Main IPC: C23C016/00
- IPC: C23C016/00
Abstract:
An apparatus for cyclical depositing of thin films on semiconductor substrates, comprising a process chamber having a gas distribution system with separate paths for process gases and an exhaust system synchronized with operation of valves dosing the process gases into a reaction region of the chamber.
Public/Granted literature
- US07175713B2 Apparatus for cyclical deposition of thin films Public/Granted day:2007-02-13
Information query
