Invention Application
- Patent Title: Pad assembly for electrochemical mechanical processing
- Patent Title (中): 焊接组件用于电化学机械加工
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Application No.: US10744904Application Date: 2003-12-23
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Publication No.: US20040163946A1Publication Date: 2004-08-26
- Inventor: Shou-Sung Chang , Stan D. Tsai , Donald J.K. Olgado , Liang-Yuh Chen , Alain Duboust , Ralph M. Wadensweiler
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: null
- Assignee: APPLIED MATERIALS, INC.
- Current Assignee: APPLIED MATERIALS, INC.
- Current Assignee Address: null
- Main IPC: C25D017/00
- IPC: C25D017/00

Abstract:
Embodiments of a pad assembly for processing a substrate are provided. The pad assembly includes a processing layer having a working surface adapted to process a substrate, a lower layer coupled to and disposed below the processing layer, and an electrode having an upper surface disposed above the lower layer and below the working surface of the processing layer. The upper surface of the electrode is at least partially exposed to the working surface to provide an electrolyte pathway between the upper surface of the electrode and the working surface.
Public/Granted literature
- US07029365B2 Pad assembly for electrochemical mechanical processing Public/Granted day:2006-04-18
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