发明申请
US20050006222A1 Self-ionized and inductively-coupled plasma for sputtering and resputtering
有权
用于溅射和再溅射的自电离和电感耦合等离子体
- 专利标题： Self-ionized and inductively-coupled plasma for sputtering and resputtering
- 专利标题（中）： 用于溅射和再溅射的自电离和电感耦合等离子体
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申请号： US10495506申请日： 2002-11-14
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公开(公告)号： US20050006222A1公开(公告)日： 2005-01-13
- 发明人: Peijun Ding , Rong Tao , Zheng Xu , Daniel Lubben , Suraj Rengarajan , Michael Miller , Arvind Sundarrajan , Xianmin Tang , John Forster , Jianming Fu , Roderick Mosely , Fusen Chen , Praburam Gopalraja
- 申请人： Peijun Ding , Rong Tao , Zheng Xu , Daniel Lubben , Suraj Rengarajan , Michael Miller , Arvind Sundarrajan , Xianmin Tang , John Forster , Jianming Fu , Roderick Mosely , Fusen Chen , Praburam Gopalraja
- 国际申请： PCT/US02/36940 WO 20021114
- 主分类号： C23C14/04
- IPC分类号： C23C14/04 ; C23C14/34 ; C23C14/35 ; C23C14/56 ; H01J37/32 ; H01J37/34 ; H01L21/285 ; H01L21/4763 ; H01L21/768 ; C23C14/00 ; C23C14/32 ; C25B9/00
摘要：
A magnetron sputter reactor (410) and its method of use, in which SIP sputtering and ICP sputtering are promoted is disclosed. In another chamber (412) an array of auxiliary magnets positioned along sidewalls (414) of a magnetron sputter reactor on a side towards the wafer from the target is disclosed. The magnetron (436) preferably is a small one having a stronger outer pole (442) of a first polarity surrounding a weaker inner pole (440) of a second polarity all on a yoke (444) and rotates about the axis (438) of the chamber using rotation means (446, 448, 450). The auxiliary magnets (462) preferably have the first polarity to draw the unbalanced magnetic field (460) towards the wafer (424), which is on a pedestal (422) supplied with power (454). Argon (426) is supplied through a valve (428). The target (416) is supplied with power (434).
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