发明申请
US20050006583A1 Method of inspecting pattern and inspecting instrument 有权
检查模式和检验仪器的方法

Method of inspecting pattern and inspecting instrument
摘要:
A sample inspection system having a sample stage holding a sample to be inspected corresponding to a selected file, electron beam optics so as to radiate an electron beam to the sample, a detector unit that detects a secondly generated signal attributable to the electron beam, a storage for storing a plurality of images obtained from the secondly generated signal and information for classifying the plurality of images by a type of defect in the sample, and an image processing unit. The image processing unit retrieves any of the plurality of images and classifies the retrieved image depending on the type of defect including an electrical defect and a defect in the figure.
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