发明申请
- 专利标题: Method of inspecting pattern and inspecting instrument
- 专利标题(中): 检查模式和检验仪器的方法
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申请号: US10916451申请日: 2004-08-12
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公开(公告)号: US20050006583A1公开(公告)日: 2005-01-13
- 发明人: Mari Nozoe , Hidetoshi Nishiyama , Shigeaki Hijikata , Kenji Watanabe , Koji Abe
- 申请人: Mari Nozoe , Hidetoshi Nishiyama , Shigeaki Hijikata , Kenji Watanabe , Koji Abe
- 优先权: JP11-343094 19991202
- 主分类号: G01Q30/02
- IPC分类号: G01Q30/02 ; G01N21/956 ; G01N23/20 ; G01N23/225 ; G01Q30/04 ; G01Q30/20 ; G01R1/06 ; G01R31/302 ; H01L21/027 ; H01L21/66 ; G21K7/00 ; G01N23/00
摘要:
A sample inspection system having a sample stage holding a sample to be inspected corresponding to a selected file, electron beam optics so as to radiate an electron beam to the sample, a detector unit that detects a secondly generated signal attributable to the electron beam, a storage for storing a plurality of images obtained from the secondly generated signal and information for classifying the plurality of images by a type of defect in the sample, and an image processing unit. The image processing unit retrieves any of the plurality of images and classifies the retrieved image depending on the type of defect including an electrical defect and a defect in the figure.
公开/授权文献
- US07112791B2 Method of inspecting pattern and inspecting instrument 公开/授权日:2006-09-26
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