发明申请
- 专利标题： Composition comprising an oxidizing and complexing compound
- 专利标题（中）： 组合物，其包含氧化和络合化合物
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申请号： US10451230申请日： 2001-12-21
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公开(公告)号： US20050009207A1公开(公告)日： 2005-01-13
- 发明人: Rita Vos , Paul Mertens , Albrecht Fester , Oliver Doll , Bernd Kolbesen
- 申请人： Rita Vos , Paul Mertens , Albrecht Fester , Oliver Doll , Bernd Kolbesen
- 国际申请： PCT/BE01/00219 WO 20011221
- 主分类号： B08B3/08
- IPC分类号： B08B3/08 ; A61K6/00 ; C01B15/037 ; C09K3/00 ; C09K15/30 ; C11D3/28 ; C11D3/39 ; C11D3/395 ; C11D11/00 ; D06L3/02 ; H01L21/304 ; H01L21/00 ; H01L21/302 ; H01L21/461 ; C07
摘要：
The present invention is related to a composition comprising an oxidizing compound and a complexing compound with the chemical formula wherein R1, R2, R3 and R4 are selected from the group consisting of H and any organic side chain. The oxidizing compound can be in the form of an aqueous solution. The complexing compound is for complexing metal ions. Metal ions can be present in the solution or in an external medium being contacted with the solution. The present invention can be used for cleaning a semiconductor substrate.
公开/授权文献
- US07160482B2 Composition comprising an oxidizing and complexing compound 公开/授权日：2007-01-09
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