Invention Application
- Patent Title: System and method for measuring displacement of a stage
- Patent Title (中): 测量舞台位移的系统和方法
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Application No.: US10623004Application Date: 2003-07-17
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Publication No.: US20050012918A1Publication Date: 2005-01-20
- Inventor: Alex Poon , Leonard Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
- Applicant: Alex Poon , Leonard Kho , Toru Kawaguchi , Hisashi Tazawa , Saburo Kamiya , Yasuhiro Hidaka
- Main IPC: G03B27/58
- IPC: G03B27/58 ; G03B27/62 ; G03F7/20

Abstract:
A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.
Public/Granted literature
- US07283200B2 System and method for measuring displacement of a stage Public/Granted day:2007-10-16
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