公开(公告)号：US20050012918A1

公开(公告)日：2005-01-20

申请号：US10623004

申请日：2003-07-17

申请人： Alex Poon ,  Leonard Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

发明人： Alex Poon ,  Leonard Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

IPC分类号： G03B27/58 ,  G03B27/62 ,  G03F7/20

CPC分类号： G03F7/70775

摘要： A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

摘要翻译： 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 具有重定向第一光束的第二轴和第一重定向器（260D），使得重定向的第一光束（260H）在与第一重定向器（260D）的取向相关的第一重定向路径上，与第一重定向器（260D）的取向无关 第三轴。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。

公开(公告)号：US07283200B2

公开(公告)日：2007-10-16

申请号：US10623004

申请日：2003-07-17

申请人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

发明人： Alex Ka Tim Poon ,  Leonard Wai Fung Kho ,  Toru Kawaguchi ,  Hisashi Tazawa ,  Saburo Kamiya ,  Yasuhiro Hidaka

IPC分类号： G03B27/42

CPC分类号： G03F7/70775

摘要： A measurement system (222) for measuring the position of a stage (248) along a first axis includes a first system (260) having a first beam source (260A) that directs a first beam (260H) on a first path that is parallel with a second axis and a first redirector (260D) that redirects the first beam so that the redirected first beam (260H) is on a first redirected path that is parallel with the first axis irrespective to the orientation of the first redirector (260D) about a third axis. The measurement system (222) can include a shield (380) that protects the first beam (260H) from environmental conditions.

摘要翻译： 用于测量载物台（248）沿着第一轴线的位置的测量系统（222）包括第一系统（260），该第一系统（260）具有第一光束源（260A），该第一光束源引导第一光束（260H） 与第二轴平行，并且第一重定向器（260D）重定向第一光束，使得重定向的第一光束（260H）在与第一轴平行的第一重定向路径上，而与第一重定向器 （260D）围绕第三轴线。 测量系统（222）可以包括保护第一光束（260H）免受环境条件影响的屏蔽（380）。

公开(公告)号：US06710854B2

公开(公告)日：2004-03-23

申请号：US09991696

申请日：2001-11-26

申请人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

发明人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

IPC分类号： G03B2754

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

摘要翻译： 一种投射曝光装置，包括：包含光源的照射光学系统和照射光束照射掩模;投影光学系统，用于将掩模图案的图像投影在基板上;多个第一飞眼型光学积分器 每个具有相对于照射光学系统中的掩模的图案或与其相邻的平面设置在傅立叶变换表面上的发射侧焦平面，并且具有位于与光学偏心的多个位置的中心 照射光学系统的轴线，多个第二飞眼型光学积分器，其各自具有相对于多个第一飞眼型光学积分器中的每一个的附带端设置在傅立叶变换平面上的发射侧焦平面 或者在与其相邻的平面上并且被设置为对应于多个第一飞眼型光学积分器，并且li 用于分割和使来自光源的照射光束入射到多个第二飞眼型光学积分器中的每一个上。

公开(公告)号：US4902900A

公开(公告)日：1990-02-20

申请号：US284659

申请日：1988-12-15

申请人： Saburo Kamiya ,  Hideo Mizutani

发明人： Saburo Kamiya ,  Hideo Mizutani

IPC分类号： G01B11/26 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00

CPC分类号： G03F7/70066 ,  G01B11/26 ,  G03F9/7023

摘要： A device for detecting the levelling of an object disposed on a plane substantially perpendicular to the optic axis of main objective optical means and worked by a radiation beam from the main objective optical means comprises levelling detecting optical means including an irradiating optical system for supplying a collimated light beam to a particular area of the surface of the object from an oblique direction, and a condensing optical system having light receiving means and for condensing the light beam reflected by the particular area on the light receiving means, and field stop means providing a plurality of stop openings differing in shape from one another, the field stop means being disposed in the levelling detecting optical means, one stop opening corresponding to the shape of the particular area being selected from among the plurality of stop openings.

摘要翻译： 一种用于检测设置在与主物镜光学装置的光轴基本垂直的平面上并且由来自主物镜光学装置的辐射束加工的物体的调平的装置包括调平检测光学装置，包括用于提供准直的 光束从倾斜方向到达物体表面的特定区域，以及具有光接收装置并用于聚光由光接收装置上的特定区域反射的光束的聚光系统，以及提供多个 形状彼此不同的止动开口，所述场阻止装置设置在所述调平检测光学装置中，对应于从所述多个止动开口中选择的所述特定区域的形状的一个止动开口。

公开(公告)号：US4820899A

公开(公告)日：1989-04-11

申请号：US161944

申请日：1988-02-29

申请人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： B23K26/067 ,  H01R43/02 ,  B23K26/00

CPC分类号： B23K26/0673 ,  B23K26/067 ,  H01R43/0221

摘要： A laser working system comprises supplying means for supplying a laser beam, a working unit which includes a stage for supporting a workpiece and means for exposing the workpiece to the laser beam, and a room unit which includes wall means for surrounding the working unit and accomodates the working unit to spatially isolate it from outside of the wall means. The supplying means is arranged outside the room unit and includes first and second laser units each for generating the laser beam.The laser working system further comprises beam guiding means which creates first light path for optically communicating the first laser unit with the working unit through the wall means, and second light path for optically communicating the second laser unit with the working unit through the wall means, respectively.

摘要翻译： 一种激光加工系统，包括用于供应激光束的供给装置，包括用于支撑工件的台和用于将工件暴露于激光束的装置的工作单元，以及包括用于围绕工作单元并适应 工作单元将其与墙壁外部空间隔离。 供给装置设置在房间单元的外部，并且包括用于产生激光束的第一和第二激光单元。 所述激光加工系统还包括光束引导装置，所述光束引导装置产生用于通过所述壁装置将所述第一激光单元与所述工作单元光学连通的第一光路，以及用于通过所述壁装置将所述第二激光单元与所述作业单元光学连通的第二光路， 分别。

公开(公告)号：US20080291464A1

公开(公告)日：2008-11-27

申请号：US12042253

申请日：2008-03-04

申请人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

发明人： Michael R. Sogard ,  Bausan Yuan ,  Masahiko Okumura ,  Yosuke Shirala ,  Kiyoshi Uchikawa ,  Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G01B11/14

CPC分类号： G01B9/02027 ,  G01B9/02021 ,  G03F7/70775 ,  G03F7/709

摘要： Process tools and methods are disclosed that involve interferometric and other measurements of movements and positions relative to a process position, such as movements and positions of a stage relative to a lithographic optical system. An exemplary apparatus includes a stage that places a workpiece relative to the tool, and that is movable in at least one direction relative to the tool. At least one first interferometer system is situated relative to the stage to determine stage position in a movement direction relative to the process position. A movement-measuring device determines displacement of the tool from the process position. Using data from the interferometer system and movement-measuring device a processor determines a position of the stage relative to the tool. The processor also corrects the determined position for displacement of the tool.

摘要翻译： 公开了涉及相对于处理位置的移动和位置的干涉测量和其它测量的处理工具和方法，例如相对于平版印刷光学系统的平台的移动和位置。 一种示例性的设备包括：相对于工具放置工件并相对于工具在至少一个方向上可移动的平台。 至少一个第一干涉仪系统相对于台架设置以确定相对于处理位置的运动方向的台阶位置。 移动测量装置确定工具从过程位置的位移。 使用来自干涉仪系统和运动测量装置的数据，处理器确定舞台相对于工具的位置。 处理器还校正所确定的工具位移的位置。

公开(公告)号：US5719704A

公开(公告)日：1998-02-17

申请号：US549325

申请日：1995-10-27

申请人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

发明人： Naomasa Shiraishi ,  Yuji Kudo ,  Saburo Kamiya

IPC分类号： G03F7/20 ,  G03B27/54

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

公开(公告)号：US5018848A

公开(公告)日：1991-05-28

申请号：US236935

申请日：1988-08-26

申请人： Saburo Kamiya ,  Akikazu Tanimoto

发明人： Saburo Kamiya ,  Akikazu Tanimoto

IPC分类号： G02B6/00 ,  B23K26/06 ,  G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01S3/101

CPC分类号： G03F7/70808 ,  B23K26/06 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/0648 ,  B23K26/0665 ,  G03F7/702 ,  G03F7/70216

摘要： An apparatus for transmitting a laser beam supplied from a laser source to a working apparatus comprises a plurality of reflecting mirrors disposed in series between the laser source and the working apparatus to change the direction of the laser beam, a condensing optical system provided to condense the laser beam on the reflecting surface of the first one of the reflecting mirrors, and a relay optical system including first and second imaging devices disposed between the first reflecting mirror and the second reflecting mirror subsequent thereto in the direction of travel of the laser beam. The first imaging devices is disposed between the first reflecting mirror and the second imaging devices and has a forward focus substantially coincident with the reflecting surface of the first reflecting mirror, and the second imaging device is disposed between the first imaging device and the second reflecting mirror and has a rearward focus substantially coincident with the reflecting surface of the second reflecting mirror.

摘要翻译： 用于将从激光源供给的激光束发送到工作装置的装置包括串联设置在激光源和加工装置之间的多个反射镜，以改变激光束的方向，凝结光学系统用于冷凝 激光束在第一反射镜的反射表面上，以及中继光学系统，包括在激光束的行进方向上设置在第一反射镜和第二反射镜之间的第一和第二成像装置。 第一成像装置设置在第一反射镜和第二成像装置之间，并且具有与第一反射镜的反射表面基本一致的前焦点，并且第二成像装置设置在第一成像装置和第二反射镜之间 并具有与第二反射镜的反射面大致一致的向后焦点。

公开(公告)号：US4989031A

公开(公告)日：1991-01-29

申请号：US471375

申请日：1990-01-29

申请人： Saburo Kamiya

发明人： Saburo Kamiya

IPC分类号： G03F7/20

CPC分类号： G03F7/70891 ,  G03F7/70866 ,  G03F7/70875 ,  G03F7/70883

摘要： A projection exposure apparatus used for the purpose of forming extremely fine patterns, e.g., semiconductor integrated circuits on a wafer. The apparatus includes an illuminating optical system for irradiating a reticle with light emitted from a light source, a projection optical system for projecting an image of the reticle onto a wafer which is to be exposed, a first chamber for enclosing the projection exposure apparatus on the whole, a second chamber arranged inside the first chamber to enclose a space containing an optical path of an exposure light between the projection optical system and the wafer, and means for separately adjusting internal air temperatures of the first and second chambers.

摘要翻译： 用于形成非常精细图案的投影曝光装置，例如晶片上的半导体集成电路。 该装置包括照明光学系统，用于从光源发射的光照射光掩模;投影光学系统，用于将掩模版的图像投射到要暴露的晶片上;第一室，用于将投影曝光装置封装在 整体地，布置在第一室内的第二室，以包围在投影光学系统和晶片之间包含曝光光的光路的空间，以及用于分别调节第一和第二室的内部空气温度的装置。

公开(公告)号：US06741358B1

公开(公告)日：2004-05-25

申请号：US09661433

申请日：2000-09-13

申请人： Saburo Kamiya

发明人： Saburo Kamiya

IPC分类号： G01B902

CPC分类号： G03F7/70483 ,  G01B9/02003 ,  G01B9/02018 ,  G01B2290/70 ,  G03F9/7026 ,  G03F9/703

摘要： An exposure apparatus which transfers a pattern image formed on a mask on to a substrate through a projection optical system, comprising a substrate table which holds said substrate, a first sensor which measures a gap between said substrate surface held by said substrate table and a control target position, and a second sensor which measures a distance between said projection optical system and said substrate table in an optical axis direction and corrects the control target position of said first sensor.

摘要翻译： 一种曝光装置，其通过投影光学系统将掩模上形成的图案图像转印到基板上，该投影光学系统包括保持所述基板的基板台，测量由所述基板台保持的基板表面之间的间隙的第一传感器， 目标位置和第二传感器，其测量所述投影光学系统和所述基板台之间在光轴方向上的距离，并校正所述第一传感器的控制目标位置。