发明申请
US20050067098A1 Method and system for introduction of an active material to a chemical process
审中-公开
向化学工艺引入活性物质的方法和系统
- 专利标题： Method and system for introduction of an active material to a chemical process
- 专利标题（中）： 向化学工艺引入活性物质的方法和系统
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申请号： US10673376申请日： 2003-09-30
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公开(公告)号： US20050067098A1公开(公告)日： 2005-03-31
- 发明人: John Hughes , Sandra Hyland , Ralph Kim
- 申请人： John Hughes , Sandra Hyland , Ralph Kim
- 申请人地址： JP Tokyo
- 专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人： TOKYO ELECTRON LIMITED
- 当前专利权人地址： JP Tokyo
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; H01L21/311
摘要：
A method and system of for introducing an active material to a chemical process in which a processing element including a passive component and an active element is installed within the system and exposed to a chemical process performed within the system. As the chemical process proceeds, the passive component erodes and thereby exposes the active component embedded therein. The introduction of the active component to the chemical process alters the chemical process.