Invention Application
- Patent Title: Electron beam lens for micro-column electron beam apparatus and method of fabricating the same
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Application No.: US10817779Application Date: 2004-04-02
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Publication No.: US20050087696A1Publication Date: 2005-04-28
- Inventor: Sang Choi , Dae Kim
- Applicant: Sang Choi , Dae Kim
- Priority: KR2003-74927 20031025
- Main IPC: G02B3/00
- IPC: G02B3/00 ; H01J1/02 ; H01J3/18 ; H01J9/02 ; H01J9/14 ; H01J37/12 ; H01J3/14 ; G21K1/08

Abstract:
Provided is an electron beam lens for a micro-column electron beam apparatus and a method of manufacturing the same. A photosensitive glass substrate is used as a base isolation substrate and a thin metal film is grown by a plating method. Holes through which electron beam passes are formed by a lift off method after forming a resist pattern shaped as a hole on a seed metal layer and plating the thin metal film.
Public/Granted literature
- US06996896B2 Electron beam lens for micro-column electron beam apparatus and method of fabricating the same Public/Granted day:2006-02-14
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