发明申请
- 专利标题： Mirror for use in a lithographic apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 用于光刻设备的镜子，光刻设备，器件制造方法和由此制造的器件
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申请号： US10968471申请日： 2004-10-20
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公开(公告)号： US20050111080A1公开(公告)日： 2005-05-26
- 发明人: Levinus Bakker , Frank Schuurmans
- 申请人： Levinus Bakker , Frank Schuurmans
- 申请人地址： NL Veldhoven
- 专利权人： ASML NETHERLANDS B.V.
- 当前专利权人： ASML NETHERLANDS B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP03078316.1 20031020
- 主分类号： G02B1/00
- IPC分类号： G02B1/00 ; G02B1/10 ; G02B5/08 ; G03F1/24 ; G03F7/20 ; G21K1/06 ; G21K5/00 ; H01L21/00 ; H01L21/027
摘要：
A top layer of a predetermined metal is provided on a mirror for use in a lithographic apparatus having source to provide radiation of a desired wavelength. The source generates a stream of undesired metal particles that are deposited to form smaller and larger nuclei on the mirror. The top layer may interdiffuse in a predetermined temperature range with nuclei of the metal deposition. An additional layer of an alloy of the metal particles and the metal of the top layer is formed that has a higher reflectivity than a layer only comprising the metal particles would have.
公开/授权文献
信息查询
IPC分类:
| G | 物理 |
| G02 | 光学 |
| G02B | 光学元件、系统或仪器 |
| G02B1/00 | 按制造材料区分的光学元件；用于光学元件的光学涂层 |
