公开(公告)号：US20050098741A1

公开(公告)日：2005-05-12

申请号：US11000381

申请日：2004-12-01

申请人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

发明人： Levinus Bakker ,  Frank Schuurmans ,  Vadim Banine

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/425

CPC分类号： G03F7/70166 ,  G03F7/70058 ,  G03F7/708 ,  G03F7/70825 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.

摘要翻译： 用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。 箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。 箔捕获器被配置为围绕光轴可旋转。 通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。 这个碎片不会通过箔片陷阱。 以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。 箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

公开(公告)号：US20070177240A1

公开(公告)日：2007-08-02

申请号：US10596564

申请日：2004-12-16

申请人： Michael Van Beek ,  Frank Schuurmans ,  Levinus Bakker

发明人： Michael Van Beek ,  Frank Schuurmans ,  Levinus Bakker

IPC分类号： G02B26/08

CPC分类号： A61B5/1455 ,  A61B5/14532 ,  A61B5/14546 ,  A61B5/14552 ,  G01J3/36 ,  G01N21/65 ,  G01N33/49

摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.

摘要翻译： 本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。 主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。 光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。 光信号优选分为对应于加权函数的正和负光谱带的两部分。 分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。 光信号的分离和加权由两个多元光学元件实现。

公开(公告)号：US20060012761A1

公开(公告)日：2006-01-19

申请号：US10890404

申请日：2004-07-14

申请人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

发明人： Levinus Bakker ,  Vadim Banine ,  Cornelis Petrus Luijkx ,  Frank Schuurmans

IPC分类号： G03B27/52

CPC分类号： G03F7/70908 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.

摘要翻译： 光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑 图案形成装置。 图案形成装置用于使经调节的辐射束在其横截面上具有图案。 该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。 污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。 陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

公开(公告)号：US20060006350A1

公开(公告)日：2006-01-12

申请号：US11224084

申请日：2005-09-13

申请人： Frank Schuurmans ,  Levinus Bakker

发明人： Frank Schuurmans ,  Levinus Bakker

IPC分类号： H01J37/00

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70958

摘要： A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.

摘要翻译： 光刻投影装置包括掠入射收集器。 放射入射收集器由多个反射器组成。 为了减少收集器上的热量，反射器被涂覆。 收集器外部的反射器在外部具有红外辐射层。 内部反射器在外部涂有EUV反射层。

公开(公告)号：US20070105253A1

公开(公告)日：2007-05-10

申请号：US10556245

申请日：2004-05-10

申请人： Robert Hendriks ,  Sjoerd Stallinga ,  Hendrik Goossens ,  Gert 'T Hooft ,  Alexander Van Der Lee ,  Frank Schuurmans ,  Rudolf Vullers ,  Ralph Kurt ,  Bernardus Hendrikus Hendriks ,  Levinus Bakker

发明人： Robert Hendriks ,  Sjoerd Stallinga ,  Hendrik Goossens ,  Gert 'T Hooft ,  Alexander Van Der Lee ,  Frank Schuurmans ,  Rudolf Vullers ,  Ralph Kurt ,  Bernardus Hendrikus Hendriks ,  Levinus Bakker

IPC分类号： H01L21/00

CPC分类号： B29C59/022 ,  B29C2059/023 ,  B29D17/005 ,  B29L2017/003 ,  G11B7/00736 ,  G11B7/263

摘要： In the described method of producing a plurality of bodies bearing equal imprints of a stamp as optical structures, a stamp (13) is initially produced, by attaching particles (14) to a surface (15) of an auxiliary body (16); than, the stamp (13) is used to produce an imprint (11) on a plurality of bodies (10). Optical structures can be irradiated, producing on a screen a speckle pattern indicative of a key. It is substantially impossible to clone a given optical structure with current technological means. Optical structures represent physical One-Way Functions, easy to compute in the forward sense but unfeasible to reverse. Thus, they can be used to build an access/copy protection system of user information contained in an information carrier associated with the body 10. The reproducibility of the optical structures makes this method suitable for optical disks.

摘要翻译： 在所述制造多个具有作为光学结构的印模的印记的物体的方法中，通过将颗粒（14）附着在辅助体（16）的表面（15）上，最初产生印模（13）。 使用印模（13）在多个主体（10）上产生印记（11）。 可以照射光学结构，在屏幕上产生指示关键的斑点图案。 以目前的技术手段克隆给定的光学结构是完全不可能的。 光学结构表示物理单向函数，容易在正向方面计算，但不可逆转。 因此，它们可以用于构建包含在与主体10相关联的信息载体中的用户信息的访问/复制保护系统。 光学结构的再现性使得该方法适用于光盘。

公开(公告)号：US20060219950A1

公开(公告)日：2006-10-05

申请号：US11094490

申请日：2005-03-31

申请人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

发明人： Levinus Bakker ,  Vadim Banine ,  Vladimir Ivanov ,  Konstantin Koshelev ,  Bastiaan Mertens ,  Johannes Moors ,  Frank Schuurmans ,  Givi Zukavishvili ,  Bastiaan Wolschrijn ,  Marc Van Der Velden

IPC分类号： G03F7/20 ,  G21K5/00

CPC分类号： G03F7/70933 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70916

摘要： A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.

摘要翻译： 光刻设备被布置成将来自辐射源的光束投影到基底上。 该装置包括在光束的路径中的光学元件，用于将气体引入光束的路径中的气体入口，使得气体将被光束离子化以产生朝向光学元件的电场，并且气体源耦合 到用于供应气体的气体入口。 气体具有用于溅射光学元件的动能阈值，其大于由电场中的气体的离子产生的动能。

公开(公告)号：US20060158734A1

公开(公告)日：2006-07-20

申请号：US10539540

申请日：2003-12-19

申请人： Frank Schuurmans ,  Michael Van Beek ,  Levinus Bakker ,  Wouter Rensen ,  Bernardus Hendrikus Hendriks ,  Robert Hendriks ,  Thomas Steffen

发明人： Frank Schuurmans ,  Michael Van Beek ,  Levinus Bakker ,  Wouter Rensen ,  Bernardus Hendrikus Hendriks ,  Robert Hendriks ,  Thomas Steffen

IPC分类号： G02B27/28

CPC分类号： G01J3/02 ,  G01J3/0205 ,  G01J3/021 ,  G01J3/10 ,  G01J3/28 ,  G01J3/36 ,  G01N21/274 ,  G01N21/31 ,  G01N2021/3196 ,  G01N2201/129

摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.

摘要翻译： 用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。 光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。 血液分析系统（40）包括根据本发明的光学分析系统（20）。

公开(公告)号：US20060139604A1

公开(公告)日：2006-06-29

申请号：US11319199

申请日：2005-12-28

申请人： Arnoud Wassink ,  Levinus Bakker ,  Johannes Moors ,  Frank Schuurmans

发明人： Arnoud Wassink ,  Levinus Bakker ,  Johannes Moors ,  Frank Schuurmans

IPC分类号： G02B5/08 ,  G03B27/54

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam, a projection system configured to project the radiation beam onto a substrate, and a filter system for filtering debris particles out of the radiation beam. The filter system includes a plurality of foils for trapping the debris particles, a support for holding the plurality of foils, and a cooling system having a surface that is arranged to be cooled. The cooling system and the support are positioned with respect to each other such that a gap is formed between the surface of the cooling system and the support. The cooling system is further arranged to inject gas into the gap.

公开(公告)号：US20070222956A1

公开(公告)日：2007-09-27

申请号：US11798710

申请日：2007-05-16

申请人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

发明人： Levinus Bakker ,  Marcel Marie Dierichs ,  Johannes Freriks ,  Frank Schuurmans ,  Jakob Vijfvinkel ,  Wilhelmus Box

IPC分类号： G03B27/52

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A contamination barrier configured to permit radiation from a radiation source to pass through and to capture debris from the radiation source. The contamination barrier includes a support structure, a plurality of plate members arranged on the support structure and extending in a radial direction from an axis of the support structure, and a shield configured to block at least part of the support structure from being hit by radiation or debris from the radiation source.

摘要翻译： 被配置为允许来自辐射源的辐射通过并捕获来自辐射源的碎屑的污染屏障。 污染屏障包括支撑结构，布置在支撑结构上并沿着径向方向从支撑结构的轴线延伸的多个板构件以及被构造成阻挡支撑结构的至少一部分被辐射撞击的屏蔽 或来自辐射源的碎片。

公开(公告)号：US20050253091A1

公开(公告)日：2005-11-17

申请号：US10844577

申请日：2004-05-13

申请人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

发明人： Ralph Kurt ,  Levinus Bakker ,  Frank Schuurmans ,  Jan Van Der Werf

IPC分类号： G03B27/52 ,  G03F7/20 ,  G21K1/06 ,  G21K5/00 ,  G21K5/02 ,  H01L21/027

CPC分类号： B82Y10/00 ,  G03F7/70033 ,  G03F7/7005 ,  G21K1/06

摘要： A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

摘要翻译： 光刻投影设备包括被配置为提供辐射束的照明系统; 被配置为支撑图案形成装置的支撑件，所述图案形成装置被构造成在其横截面中赋予所述辐射束的图案; 被配置为保持衬底的衬底台和被配置为将所述图案化的辐射束投射到所述衬底的目标部分上的投影系统，其中所述照明系统具有辐射源和至少一个配置成增强所述源的输出的反射镜 。 照明系统可以包括第二辐射源和位于辐射源之间的至少一个反射镜，以将第二源的输出成像到第一源上，从而增强源的输出。 辐射源可以可操作地发射EUV波长范围内的辐射。