发明申请
- 专利标题: Non-volatile memory and the fabrication method thereof
- 专利标题(中): 非易失性存储器及其制造方法
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申请号: US11038034申请日: 2005-01-21
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公开(公告)号: US20050121659A1公开(公告)日: 2005-06-09
- 发明人: Hideyuki Tanaka , Kiyoshi Morimoto
- 申请人: Hideyuki Tanaka , Kiyoshi Morimoto
- 专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 当前专利权人: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.
- 优先权: JP2002-106167 20020409
- 主分类号: G11B9/00
- IPC分类号: G11B9/00 ; G11B9/04 ; G11C11/22 ; G11C16/02 ; H01L27/10 ; H01L27/24 ; H01L45/00 ; H01L27/108 ; H01L29/76
摘要:
A non-volatile memory, which comprises an insulating substrate (11) that has a first electrode (18) that extends through the substrate from the front surface to the rear surface thereof; a second electrode (13) that is formed on one side of the insulating substrate (11); and a recording layer (12) that is clamped between the first electrode (18) and the second electrode (13) and whose resistance value varies when an electric pulse is applied across the first electrode (18) and the second electrode (13); wherein the insulating substrate (11) has a layered structure composed of an organic dielectric thin film (112) and an inorganic dielectric layer (111) that is thinner than the organic dielectric thin film (112); with the recording layer (12) being formed on the side on which the inorganic dielectric layer is formed. Use of this non-volatile memory increases the possible number of data writing cycles while saving power.
公开/授权文献
- US07115473B2 Method of fabrication of non-volatile memory 公开/授权日:2006-10-03
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