Invention Application
- Patent Title: Capacitor including a dielectric layer having an inhomogeneous crystalline region and method of fabricating the same
- Patent Title (中): 电容器包括具有不均匀结晶区域的电介质层及其制造方法
-
Application No.: US11032150Application Date: 2005-01-11
-
Publication No.: US20050152094A1Publication Date: 2005-07-14
- Inventor: Yong-kuk Jeong , Jung-Hyoung Lee , Seok-Jun Won , Dae-Jin Kwon , Weon-Hong Kim , Min-woo Song
- Applicant: Yong-kuk Jeong , Jung-Hyoung Lee , Seok-Jun Won , Dae-Jin Kwon , Weon-Hong Kim , Min-woo Song
- Priority: KR2004-2761 20040114
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01G4/10 ; H01G4/20 ; H01L21/02 ; H01L27/08 ; H01G4/28

Abstract:
In a capacitor, and a method of fabricating the same, the capacitor includes a lower electrode, a dielectric layer on the lower electrode, and an upper electrode on the dielectric layer, wherein the dielectric layer includes a lower dielectric region contacting the lower electrode, an upper dielectric region contacting the upper electrode, and at least one middle dielectric region between the lower dielectric region and the upper dielectric region, the at least one middle dielectric region having a less crystalline region than both the lower dielectric region and the upper dielectric region.
Public/Granted literature
Information query
IPC分类: