发明申请
US20050153507A1 Fabrication method for a trench capacitor with an insulation collar
审中-公开
具有绝缘套管的沟槽电容器的制造方法
- 专利标题: Fabrication method for a trench capacitor with an insulation collar
- 专利标题(中): 具有绝缘套管的沟槽电容器的制造方法
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申请号: US11013921申请日: 2004-12-17
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公开(公告)号: US20050153507A1公开(公告)日: 2005-07-14
- 发明人: Thomas Hecht , Till Schlosser , Michael Sesterhenn
- 申请人: Thomas Hecht , Till Schlosser , Michael Sesterhenn
- 申请人地址: DE Munich
- 专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人: INFINEON TECHNOLOGIES AG
- 当前专利权人地址: DE Munich
- 优先权: DE10359580.5 20031218
- 主分类号: H01L21/265
- IPC分类号: H01L21/265 ; H01L21/76 ; H01L21/8242
摘要:
The present invention provides a fabrication method for a trench capacitor with an insulation collar in a substrate, which is electrically connected to the substrate on one side via a buried contact. After forming and sinking an electrically conductive filling, an insulation collar and, if appropriate, a buried contact that is connected on all sides, the following are effected: providing at least one liner layer in the trench; filling the trench with a filling made of an auxiliary material, which filling is encapsulated by the at least one liner layer in the trench; providing a mask on the filling for defining the structure of the buried contact, the mask having no projections into the trench; removing a part of the filling using the mask; removing an underlying part of the at least one liner layer for uncovering a corresponding part of the insulation collar.
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