发明申请
US20050172899A1 Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
有权
层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置
- 专利标题： Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus
- 专利标题（中）： 层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置
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申请号： US11073248申请日： 2005-03-04
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公开(公告)号： US20050172899A1公开(公告)日： 2005-08-11
- 发明人: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
- 申请人： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
- 申请人地址： JP Tokyo
- 专利权人： KONICA CORPORATION
- 当前专利权人： KONICA CORPORATION
- 当前专利权人地址： JP Tokyo
- 优先权： JP2000-377044 20001212; JP2001-175475 20010611
- 主分类号： C23C4/18
- IPC分类号： C23C4/18 ; C23C16/509 ; C23C16/54 ; C23C16/00
摘要：
A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
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