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1.发明授权Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus 有权层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置公开(公告)号：US07421974B2
公开(公告)日：2008-09-09
申请号：US11073248
申请日：2005-03-04
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: C23C16/00
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
Abstract translation: 公开了一种层形成方法，其包括以下步骤：在超过100kHz的高频电压下跨越第一电极和第二电极相对的间隙提供不小于1W / cm 2的功率 彼此在大气压或大气压下引起放电，通过电荷产生处于等离子体状态的反应性气体，并将衬底暴露于等离子体状态的反应气体，以在衬底上形成一层。
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公开(公告)号：US20050181606A1
公开(公告)日：2005-08-18
申请号：US11089809
申请日：2005-03-25
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: C23C4/18 , C23C16/509 , C23C16/54 , H01L21/44
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
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公开(公告)号：US06835425B2
公开(公告)日：2004-12-28
申请号：US10181827
申请日：2002-07-22
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: H05H124
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
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4.发明授权Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus 有权层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置公开(公告)号：US07044078B2
公开(公告)日：2006-05-16
申请号：US10302359
申请日：2002-11-22
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
Abstract translation: 公开了一种层形成方法，其包括以下步骤：在超过100kHz的高频电压下跨越第一电极和第二电极相对的间隙提供不小于1W / cm 2的功率 彼此在大气压或大气压下引起放电，通过电荷产生处于等离子体状态的反应性气体，并将衬底暴露于等离子体状态的反应气体，以在衬底上形成一层。
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Patent Agency Ranking
5.发明授权Half mirror film producing method and optical element comprising a half mirror film 失效半透膜制造方法和包括半透膜的光学元件公开(公告)号：US06903512B2
公开(公告)日：2005-06-07
申请号：US10207458
申请日：2002-07-29
Applicant: Tatsuo Ohta , Satoshi Nakano , Yumi Muramatsu
Inventor： Tatsuo Ohta , Satoshi Nakano , Yumi Muramatsu
CPC classification number: C23C16/402 , C03C17/3417 , C03C2217/212 , C03C2217/213 , C03C2218/153 , C23C16/403 , C23C16/405 , C23C16/545
Abstract: A method of producing a half mirror film on a substrate having a light transmissive property, comprising steps of: electrically discharging between electrodes facing each other under an atmospheric pressure or an approximate atmospheric pressure so as to make an reactive gas on a plasma state; and exposing a substrate to the reactive gas on the plasma state so as to form a half mirror film on the substrate.
Abstract translation: 一种在具有透光性的基板上制造半透膜的方法，包括以下步骤：在大气压或近似大气压下彼此面对的电极之间电放电，使反应气体处于等离子体状态; 以及在等离子体状态下将衬底暴露于反应性气体，以在衬底上形成半透膜。
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6.发明授权Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus 失效层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置公开(公告)号：US07462379B2
公开(公告)日：2008-12-09
申请号：US11089809
申请日：2005-03-25
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: H05H1/24
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
Abstract translation: 公开了一种层形成方法，其包括以下步骤：在大气压下或大约压力下彼此相对的第一电极和第二电极之间的间隙处，在超过100kHz的高频电压下提供不小于1W / cm 2的功率 大气压力以引起放电，通过电荷产生处于等离子体状态的反应气体，以及将基板以等离子体状态暴露于反应性气体，以在基板上形成层。
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公开(公告)号：US20080268172A1
公开(公告)日：2008-10-30
申请号：US12156337
申请日：2008-05-30
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: H05H1/24
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532 , Y02T50/6765
Abstract: A layer forming method is disclosed which relies on reactive gas in a plasma state. The method includes steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
Abstract translation: 公开了一种依赖于等离子体状态的反应气体的层形成方法。 该方法包括以下步骤：在大气压下彼此相对的第一电极和第二电极之间的间隙处，在超过100kHz的高频电压下提供不小于1W / cm 2的功率，或 在大气压下引起放电，通过电荷产生处于等离子体状态的反应性气体，并将衬底暴露于等离子体状态的反应气体，以在衬底上形成一层。
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8.发明申请Layer forming method, product comprising the layer, optical film, dielectric-coated electrode and plasma discharge apparatus 有权层形成方法，包括该层的产品，光学膜，电介质涂覆电极和等离子体放电装置公开(公告)号：US20050172899A1
公开(公告)日：2005-08-11
申请号：US11073248
申请日：2005-03-04
Applicant: Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
Inventor： Kazuhiro Fukuda , Yoshikazu Kondo , Takashi Murakami , Shunichi Iwamaru , Yumi Muramatsu , Toshio Tsuji
IPC: C23C4/18 , C23C16/509 , C23C16/54 , C23C16/00
CPC classification number: G02B1/11 , C23C4/10 , C23C4/18 , C23C16/402 , C23C16/405 , C23C16/509 , C23C16/5093 , C23C16/545 , G02B1/10 , G02B1/115 , G02B1/14 , G02B1/16 , G02B1/18 , H01J37/32532
Abstract: A layer forming method is disclosed which comprises the steps of supplying power of not less than 1 W/cm2 at a high frequency voltage exceeding 100 kHz across a gap between a first electrode and a second electrode opposed to each other at atmospheric pressure or at approximately atmospheric pressure to induce a discharge, generating a reactive gas in a plasma state by the charge, and exposing a substrate to the reactive gas in a plasma state to form a layer on the substrate.
Abstract translation: 公开了一种层形成方法，其包括以下步骤：在超过100kHz的高频电压下跨越第一电极和第二电极相对的间隙提供不小于1W / cm 2的功率 彼此在大气压或大气压下引起放电，通过电荷产生处于等离子体状态的反应性气体，并将衬底暴露于等离子体状态的反应气体，以在衬底上形成一层。
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9.发明授权公开(公告)号：US06289254B1
公开(公告)日：2001-09-11
申请号：US09010308
申请日：1998-01-21
Applicant: Munenori Shimizu , Takanobu Ichiki , Motoaki Kato , Kimiyoshi Hayashi , Hideki Sawada , Katsuya Sato , Yumi Muramatsu , Hiroshi Kochiya , Takahiro Nakagawa , Tadatsugu Iyoda
Inventor： Munenori Shimizu , Takanobu Ichiki , Motoaki Kato , Kimiyoshi Hayashi , Hideki Sawada , Katsuya Sato , Yumi Muramatsu , Hiroshi Kochiya , Takahiro Nakagawa , Tadatsugu Iyoda
IPC: G06F1900
CPC classification number: G06F17/50 , G06F2217/74
Abstract: Since a plurality of electric CAD systems (CAD) 1 generate circuit diagram data with different data structures, input interface (IF) software (SOFT) implements processing for extracting predetermined item data used in parts selection SOFT from each CAD, and processing for adding data obtained by the parts selection SOFT to each CAD. The parts selection SOFT implements selection of parts, output of slips, and the like on the basis of the predetermined item data. Output IF-SOFT converts information associated with the selected parts output from the parts selection SOFT into a different data format used in the subsequent process, and outputs the converted information.
Abstract translation: 由于多个电子CAD系统（CAD）1生成具有不同数据结构的电路图数据，所以输入接口（IF）软件（SOFT）实现从每个CAD提取在部件选择SOFT中使用的预定项目数据的处理，以及用于添加数据的处理 通过零件选择SOFT获得到每个CAD。 部件选择SOFT基于预定项目数据实现部件的选择，滑移输出等。 输出IF-SOFT将与从零件选择SOFT输出的选定部件相关联的信息转换为后续处理中使用的不同数据格式，并输出转换后的信息。
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