发明申请
- 专利标题: Method of forming fine pattern
- 专利标题(中): 形成精细图案的方法
-
申请号: US11057832申请日: 2005-02-15
-
公开(公告)号: US20050181304A1公开(公告)日: 2005-08-18
- 发明人: Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
- 申请人: Takayuki Araki , Tsuneo Yamashita , Takuji Ishikawa , Tomohiro Yoshida , Takuya Hagiwara , Takamitsu Furukawa
- 专利权人: DAIKIN INDUSTRIES, LTD,SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
- 当前专利权人: DAIKIN INDUSTRIES, LTD,SEMICONDUCTOR LEADING EDGE TECHNOLOGIES, INC.
- 优先权: JP2004-38840 20040216
- 主分类号: C08F214/18
- IPC分类号: C08F214/18 ; C08F232/08 ; G03C1/492 ; G03F7/004 ; G03F7/033 ; G03F7/039 ; H01L21/027
摘要:
There is provided a method of forming a fine pattern by using a highly practicable fluorine-containing polymer which has a high transparency to exposure light having a short wavelength such as F2 laser and can improve dry etching resistance without remarkably lowering transparency. The method comprises (I) a step for preparing a resist composition comprising (a) a fluorine-containing polymer having protective group, (b) a photoacid generator and (c) a solvent; (II) a step for forming a resist film comprising the above-mentioned resist composition on a substrate or on a given layer on the substrate; (III) a step for exposing by selectively irradiating given areas of the resist film with energy ray, and (IV) a step for subjecting the exposed resist film to developing treatment and selectively removing the exposed portions of the resist film to form a fine pattern, in which the fluorine-containing polymer (a) having protective group is a fluorine-containing polymer comprising a structural unit (M2-1A) derived from a norbornene derivative having OH group and a structural unit (M2-1B) derived from a norbornene derivative having a saturated hydrocarbon group containing bicyclo saturated hydrocarbon structure as a protective group.