发明申请
- 专利标题： Method and system to measure characteristics of a film disposed on a substrate
- 专利标题（中）： 测量设置在基板上的膜的特性的方法和系统
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申请号： US10782187申请日： 2004-02-19
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公开(公告)号： US20050185169A1公开(公告)日： 2005-08-25
- 发明人: Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
- 申请人： Ian McMackin , Philip Schumaker , Byung-Jin Choi , Sidlgata Sreenivasan , Michael Watts
- 申请人地址： US TX Austin
- 专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人： MOLECULAR IMPRINTS, INC.
- 当前专利权人地址： US TX Austin
- 主分类号： B81C1/00
- IPC分类号： B81C1/00 ; B81C99/00 ; G01N21/84 ; G03F7/00 ; G03F7/20 ; G01N21/88
摘要：
The present invention is directed to providing a method and system to measure characteristics of a film disposed on a substrate. The method includes identifying a plurality of processing regions on the film; measuring characteristics of a subset of the plurality of processing regions, defining measured characteristics; determining a variation of one of the measured characteristics; and associating a cause of the variations based upon a comparison of the one of the measured characteristics to measured characteristics associated with the remaining processing regions of the subset. The system carries out the aforementioned method.
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