发明申请
- 专利标题： Ultra high transmission phase shift mask blanks
- 专利标题（中）： 超高透射相移掩模毛坯
-
申请号： US11040115申请日： 2005-01-24
-
公开(公告)号： US20050190450A1公开(公告)日： 2005-09-01
- 发明人: Hans Becker , Frank Schmidt , Oliver Goetzberger , Guenter Hess , Ute Buttgereit , Frank Sobel , Markus Renno
- 申请人： Hans Becker , Frank Schmidt , Oliver Goetzberger , Guenter Hess , Ute Buttgereit , Frank Sobel , Markus Renno
- 优先权： EP04008566.4 20040408; EP04001359.1 20040122
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; C03C17/34 ; C23C16/455 ; G03F1/00 ; G03F1/08 ; G02B27/00
摘要：
The present invention relates to phase shift mask blanks for exposure wavelength of less than 300 nm, a process for their preparation, to phase shift masks manufactured by such phase shift mask blanks and a process for the preparation of said phase shift masks.
信息查询
IPC分类:
