发明申请
US20050191563A1 Method and system for reducing and monitoring precipitated defects on masking reticles
有权
用于减少和监测掩蔽掩模版上沉淀的缺陷的方法和系统
- 专利标题： Method and system for reducing and monitoring precipitated defects on masking reticles
- 专利标题（中）： 用于减少和监测掩蔽掩模版上沉淀的缺陷的方法和系统
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申请号： US10787698申请日： 2004-02-26
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公开(公告)号： US20050191563A1公开(公告)日： 2005-09-01
- 发明人: Yi-Ming Dai , Ting-Yu Lin , Ho-Ku Lan , Li-Kong Turn , Heng-Hsin Liu , Louie Liu , Tony Wu , Chi-Hung Liao
- 申请人： Yi-Ming Dai , Ting-Yu Lin , Ho-Ku Lan , Li-Kong Turn , Heng-Hsin Liu , Louie Liu , Tony Wu , Chi-Hung Liao
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/20 ; G03F9/00
摘要：
A method and system is disclosed for reducing and monitoring precipitated defects on mask reticles. A predetermined gas is provided into an environment surrounding the reticle assembly for reducing a formation of the precipitated defects around the mask reticle caused by photolithography under a light source having a small wavelength.
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