发明申请
- 专利标题： Polishing composition and polishing method
- 专利标题（中）： 抛光组合物和抛光方法
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申请号： US11083363申请日： 2005-03-17
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公开(公告)号： US20050204637A1公开(公告)日： 2005-09-22
- 发明人: Kazusei Tamai , Yasuyuki Yamato
- 申请人： Kazusei Tamai , Yasuyuki Yamato
- 专利权人： Fujimi Incorporated
- 当前专利权人： Fujimi Incorporated
- 优先权： JPPAT.2004-081583 20040319
- 主分类号： B24B37/00
- IPC分类号： B24B37/00 ; C09G1/02 ; C09K3/14 ; C23F1/28 ; H01L21/304 ; H01L21/306 ; B24D3/02
摘要：
A polishing composition includes an abrasive, phosphoric acid, and an oxidizing agent and has a pH of 6 or less. The polishing composition has the capability for polishing an alloy containing nickel and iron with a high stock removal rate. Accordingly, the polishing composition is preferably used in an application for polishing an object including the alloy containing nickel and iron.
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