发明申请
US20050208754A1 Method of growing electrical conductors 有权
生长电导体的方法

Method of growing electrical conductors
摘要:
A method for forming a conductive thin film includes depositing a metal oxide thin film on a substrate by an atomic layer deposition (ALD) process. The method further includes at least partially reducing the metal oxide thin film by exposing the metal oxide thin film to a gaseous inorganic reducing agent, thereby forming a metal layer. In preferred arrangements, the reducing agent comprises of thermal hydrogen (H2), hydrogen radicals (H*) and/or carbon monoxide (CO).
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