发明申请
- 专利标题： Projection objective for immersion lithography
- 专利标题（中）： 浸没光刻的投影目标
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申请号： US11015553申请日： 2004-12-20
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公开(公告)号： US20050225737A1公开(公告)日： 2005-10-13
- 发明人: Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
- 申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
- 专利权人： CARL ZEISS SMT AG
- 当前专利权人： CARL ZEISS SMT AG
- 优先权： DE102004051730.4 20041022
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03F7/20
摘要：
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
公开/授权文献
- US07460206B2 Projection objective for immersion lithography 公开/授权日：2008-12-02