公开(公告)号：US20120224160A1

公开(公告)日：2012-09-06

申请号：US13313641

申请日：2011-12-07

申请人： Aurelian Dodoc ,  Christoph Zaczek ,  Sascha Migura ,  Gerhard Braun ,  Hans-Juergen Mann ,  Hans-Jochen Paul

发明人： Aurelian Dodoc ,  Christoph Zaczek ,  Sascha Migura ,  Gerhard Braun ,  Hans-Juergen Mann ,  Hans-Jochen Paul

IPC分类号： G03B27/70 ,  G03B27/32 ,  G02B23/00

CPC分类号： G02B17/0657 ,  G03F7/70233

摘要： An optical imaging system serving for imaging a pattern arranged in an object plane of the imaging system into an image plane of the imaging system with the aid of electromagnetic radiation from a wavelength range around a main wavelength λ0 has a multiplicity of mirrors. Each mirror has a mirror surface having a reflective layer arrangement having a sequence of individual layers.

摘要翻译： 借助于来自主波长λ0附近的波长范围的电磁辐射，用于将配置在成像系统的物体平面中的图案成像成像系统的图像平面的光学成像系统具有多个反射镜。 每个反射镜具有镜面，反射层布置具有单个层序列。

公开(公告)号：US20120212810A1

公开(公告)日：2012-08-23

申请号：US13347431

申请日：2012-01-10

申请人： Hans-Jochen Paul ,  Gerhard Braun ,  Sascha Migura ,  Aurelian Dodoc ,  Christoph Zaczek

发明人： Hans-Jochen Paul ,  Gerhard Braun ,  Sascha Migura ,  Aurelian Dodoc ,  Christoph Zaczek

IPC分类号： G02B5/08

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70941 ,  G21K1/062 ,  G21K2201/064 ,  G21K2201/067

摘要： EUV-mirror having a substrate (S) and a layer arrangement that includes plural layer subsystems (P″, P′″) each consisting of a periodic sequence of at least two periods (P2, P3) of individual layers. The periods (P2, P3) include two individual layers composed of different materials for a high refractive index layer (H″, H′″) and a low refractive index layer (L″, L′″) and have within each layer subsystem (P″, P′″) a constant thickness (d2, d3) that deviates from that of the periods of an adjacent layer subsystem. In one alternative, the layer subsystem (P″) second most distant from the substrate has a period sequence (P2) such that the first high refractive index layer (H′″) of the layer subsystem (P′″) most distant from the substrate directly succeeds the last high refractive index layer (H″) of the layer subsystem (P″) second most distant from the substrate

摘要翻译： 具有基板（S）的EUV反射镜以及包括多层子系统（P“，P”“）的层布置，每个子系统由各层的至少两个周期（P2，P3）的周期性序列构成。 周期（P2，P3）包括由用于高折射率层（H“，H”“）和低折射率层（L”，L“”）的不同材料组成的两个单独层，并且在每个层子系统 P“，P”“）与相邻层子系统的周期偏差的恒定厚度（d2，d3）。 在一个替代方案中，距衬底第二最远的层子系统（P“）具有周期序列（P2），使得层子系统（P'”）的第一高折射率层（H“”）最远离 衬底直接成为距离衬底最远的层子系统（P“）的最后一个高折射率层（H”）

公开(公告)号：US20120134015A1

公开(公告)日：2012-05-31

申请号：US13274006

申请日：2011-10-14

申请人： Hans-Jochen PAUL ,  Gerhard BRAUN ,  Sascha MIGURA ,  Aurelian DODOC ,  Christoph ZACZEK

发明人： Hans-Jochen PAUL ,  Gerhard BRAUN ,  Sascha MIGURA ,  Aurelian DODOC ,  Christoph ZACZEK

IPC分类号： G02B5/08

CPC分类号： G02B5/0875 ,  B82Y10/00 ,  G02B5/0891 ,  G03F7/70958 ,  G21K1/062

摘要： EUV mirror with a layer arrangement on a substrate. The layer arrangement includes a plurality of layer subsystems each consisting of a periodic sequence of at least one period of individual layers. The periods include two individual layers composed of different material for a high refractive index layer and a low refractive index layer and have within each subsystem a constant thickness that deviates from a period thickness of an adjacent layer subsystem. The subsystem most distant from the substrate has (i) a number of periods greater than the number of periods for the layer subsystem that is second most distant from the substrate and/or (ii) a thickness of the high refractive index layer that deviates by more than 0.1 nm from that of the high refractive index layer of the subsystem that is second most distant from the substrate.

摘要翻译： 在基板上具有层布置的EUV反射镜。 层布置包括多个层子系统，每个层子系统由至少一个单独层周期的周期序列组成。 这些周期包括由用于高折射率层和低折射率层的不同材料组成的两个单独层，并且在每个子系统内具有偏离相邻层子系统的周期厚度的恒定厚度。 最远离衬底的子系统具有（i）大于距离衬底第二最远层的层子系统的周期数的数量的周期和/或（ii）高折射率层的厚度偏离 比距离衬底第二最远的子系统的高折射率层大0.1nm以上。

公开(公告)号：US20070242250A1

公开(公告)日：2007-10-18

申请号：US11765200

申请日：2007-06-19

申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

IPC分类号： G02B27/28 ,  G03B27/52 ,  H01L21/00

CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

摘要： Objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. In the case of objectives with at least two fluoride crystal lenses, it is favorable if the fluoride crystal lenses are arranged such that they are rotated with respect to one another. The lens axes of the fluoride crystal lenses may in this case point not only in the crystallographic direction but also in the crystallographic direction or in the crystallographic direction. A further reduction in the detrimental influence of birefringence is achieved by the simultaneous use of groups with (100)-lenses rotated with respect to one another and groups with (111)-lenses or (110)-lenses rotated with respect to one another. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

摘要翻译： 目的，特别是具有至少一种氟化物晶体透镜的微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 在具有至少两个氟化物晶体透镜的物镜的情况下，如果将氟化物晶体透镜相对于彼此旋转布置是有利的。 在这种情况下，氟化物晶体透镜的透镜轴不仅在<100>晶体方向，而且在<111>晶体方向或<110>晶体方向。 双折射的有害影响的进一步减少是通过同时使用具有相对于彼此旋转的（100） - 相的组和具有相对于彼此旋转的（111） - 透镜或（110）相的组而实现的。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

公开(公告)号：US07239447B2

公开(公告)日：2007-07-03

申请号：US10931745

申请日：2004-09-01

申请人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

发明人： Aksel Goehnermeier ,  Alexandra Pazidis ,  Birgit Kuerz ,  Christoph Zaczek ,  Daniel Kraehmer

IPC分类号： G02B5/30

CPC分类号： G02B1/02 ,  G02B1/08 ,  G02B5/3083 ,  G02B13/14 ,  G02B27/0043 ,  G02B27/286 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70566 ,  G03F7/70958 ,  G03F7/70966

摘要： An objective, in particular a projection objective for a microlithography projection-exposure installation, with at least one fluoride crystal lens is disclosed. A reduction in the detrimental influence of birefringence is achieved if this lens is a (100)-lens with a lens axis which is approximately perpendicular to the {100} crystallographic planes or to the crystallographic planes equivalent thereto of the fluoride crystal. A further reduction in the detrimental influence of birefringence is obtained by covering an optical element with a compensation coating.

摘要翻译： 公开了具有至少一种氟化物晶体透镜的目的，特别是用于微光刻投影曝光装置的投影物镜。 如果该透镜是具有近似垂直于{100}晶面的透镜轴或与氟化物晶体相当的结晶平面的透镜轴，则实现双折射的有害影响的减小。 通过用补偿涂层覆盖光学元件来获得双折射的有害影响的进一步减少。

公开(公告)号：US20070007491A1

公开(公告)日：2007-01-11

申请号：US11414692

申请日：2006-04-28

申请人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

发明人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

IPC分类号： C09K19/52

CPC分类号： G02B5/3083 ,  G02B1/02 ,  G02B27/281 ,  G03F7/70966

摘要： The invention concerns an optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus, including a substrate which for light of a predetermined working wavelength which passes through the substrate causes a first retardation between mutually perpendicular polarization states, and a layer which is epitaxially grown on the substrate and which is made from a material with non-cubic crystal structure, which by virtue of natural birefringence causes a second retardation between mutually perpendicular polarization states, which at least partially compensates for the first retardation caused in the substrate.

摘要翻译： 本发明涉及一种光学元件，特别是用于微光刻投影曝光设备的物镜或照明系统，该微光刻投影曝光设备包括用于通过基板的预定工作波长的光的基板，引起相互垂直的偏振状态之间的第一延迟，以及 在衬底上外延生长并且由具有非立方晶体结构的材料制成的层，其由于天然双折射引起相互垂直的极化状态之间的第二延迟，其至少部分地补偿在 底物。

公开(公告)号：US20050264884A1

公开(公告)日：2005-12-01

申请号：US11059364

申请日：2005-02-17

申请人： Christoph Zaczek ,  David Shafer ,  Wilhelm Ulrich

发明人： Christoph Zaczek ,  David Shafer ,  Wilhelm Ulrich

IPC分类号： G02B5/30 ,  G02B17/08 ,  G02B27/28 ,  G03F7/20

CPC分类号： G02B17/0892 ,  G02B17/045 ,  G02B27/283 ,  G03F7/70225

摘要： A projection objective (5) for microlithography for projecting a pattern arranged in an object plane (8) of the projection objective (5) has in the light path between the object plane (8) and the image plane (11) at least one beam deflecting device (19) with at least one totally reflective surface (17) that is inclined to an incidence direction of the radiation incident on the totally reflective surface (17) in such a way that substantially all the radiation coming from the object plane (8) and striking the totally reflective surface (17) is totally reflected at the totally reflective surface (17). A high reflectivity in conjunction with high angle of incidence with respect to the surface normal to the totally reflective surface (17) can be achieved with the aid of the beam deflecting device (19). In the case of catadioptric projection objectives, in particular, it is possible thereby to fashion designs that without the use of total reflection for beam deflection can be implemented only with a substantially greater outlay on construction.

摘要翻译： 用于突出布置在投影物镜（5）的物平面（8）中的图案的用于微光刻的投影物镜（5）在物平面（8）和像平面（11）之间的光路中具有至少一个光束 偏转装置（19）具有与入射在全反射表面（17）上的辐射的入射方向倾斜的至少一个全反射表面（17），使得基本上所有来自物平面（8）的辐射 ）和撞击全反射表面（17）在全反射表面（17）处被全反射。 借助于光束偏转装置（19），可以实现高反射率和高入射角相对于垂直于全反射表面（17）的表面。 在反射折射投影物镜的情况下，特别地，可以设计出不需要使用用于光束偏转的全反射的设计，只能在施工上实现更大的花费。

公开(公告)号：US20050243435A1

公开(公告)日：2005-11-03

申请号：US11061574

申请日：2005-05-12

申请人： Christoph Zaczek ,  Thomas Muelders

发明人： Christoph Zaczek ,  Thomas Muelders

IPC分类号： G02B17/08 ,  G02B27/28 ,  G03F7/20 ,  G02B3/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G02B27/283 ,  G03F7/70225

摘要： A catadioptric projection objective having a catadioptric lens section and a dioptric lens section is disclosed. Its catadioptric lens section comprises a concave mirror and a beam-deflecting device, which, in the case of one embodiment, comprises a physical beamsplitter having a polarization-beamsplitting surface, followed by a deflecting mirror. The reflectance curve of that beamsplitting surface for s-polarized light, the transmittance, TPBS, of that beamsplitting surface for p-polarized light, and the reflectance of the deflecting mirror for light coming from the beamsplitter are adapted to suit one another such that large variations in that transmittance, TPBS, for incidence angles close to the beamsplitting coating's internal Brewster angle are compensated such that the total transmittance of the beam-deflecting device remains essentially constant over the entire utilized range of incidence angles. The resultant projection objective allows uniformly illuminating the image field, without incidence of apodization effects.

摘要翻译： 公开了一种具有反射折射透镜部分和屈光透镜部分的反射折射投射物镜。 其反射折射透镜部分包括凹面镜和光束偏转装置，其在一个实施例的情况下包括具有偏振分束面的物理分束器，随后是偏转镜。 用于p偏振光的该分束表面的s偏振光的分束面的反射率曲线，透射率，以及偏转的反射率 用于来自分束器的光的反射镜适于彼此适应，使得该透射率的较大变化，以及接近分束涂层的内部布鲁斯特角的入射角 被补偿，使得光束偏转装置的总透射率在整个使用的入射角范围内保持基本恒定。 所得到的投影物镜允许均匀地照射图像场，而不会产生变迹效应。

公开(公告)号：US10146137B2

公开(公告)日：2018-12-04

申请号：US13423344

申请日：2012-03-19

申请人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

发明人： Sascha Bleidistel ,  Toralf Gruner ,  Christoph Zaczek ,  Ralf Mueller

IPC分类号： G03F7/20 ,  G02B13/14 ,  G02B17/08

摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

公开(公告)号：US20130182234A1

公开(公告)日：2013-07-18

申请号：US13786134

申请日：2013-03-05

申请人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

发明人： Paul Graupner ,  Olaf Conradi ,  Christoph Zaczek ,  Wilhelm Ulrich ,  Helmut Beierl ,  Toralf Gruner ,  Volker Graeschus

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70308

摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.

摘要翻译： 投影曝光系统包括被配置为用辐射照射掩模的照明系统。 投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。 投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。 角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。