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    Optical beam transformation system and illumination system comprising an optical beam transformation system
    8.
    发明申请
    Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
    光束变换系统和包括光束变换系统的照明系统

    公开(公告)号：US20060146384A1

    公开(公告)日：2006-07-06

    申请号：US11271976

    申请日：2005-11-14

    申请人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    发明人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    IPC分类号： G03H1/08

    CPC分类号： G03F7/70183 ,  G02B5/32 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/095 ,  G02B27/0977 ,  G03F7/70108 ,  G03F7/70566

    摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.

    摘要翻译： 可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布 光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。 光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射 用于转化面。 光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。 具有转轴表面的Axicon元件可用作转换元件。

    Illumination system for microlithography
    9.
    发明授权
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号：US08792082B2

    公开(公告)日：2014-07-29

    申请号：US12984078

    申请日：2011-01-04

    申请人： Markus Brotsack

    发明人： Markus Brotsack

    IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20

    CPC分类号： G03F7/70191 ,  G03F7/70108 ,  G03F7/70116

    摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.

    摘要翻译： 用于利用来自分配的光源的光照射照明场的微光刻投影曝光装置的照明系统包括：光瞳成形单元，用于从所分配的光源接收光，并且用于在照明的光瞳平面中产生可预定的基本光分布 系统和分配给光瞳整形单元的传输滤波器，并且具有至少一个独立驱动的单独元件阵列，用于在照明系统的光瞳平面内或附近照射在透射滤光片上的光的空间分辨透射滤波。 发送滤波器生成基本配光的预定校正。 这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，并确保高透射率。

    Illumination system for microlithography
    10.
    发明授权
    Illumination system for microlithography 有权
    微光刻照明系统

    公开(公告)号：US07884922B2

    公开(公告)日：2011-02-08

    申请号：US11860193

    申请日：2007-09-24

    申请人： Markus Brotsack

    发明人： Markus Brotsack

    IPC分类号： G03B27/72 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03F7/70191 ,  G03F7/70108 ,  G03F7/70116

    摘要： An illumination system for a microlithography projection exposure apparatus for illuminating an illumination field with the light from an assigned light source includes a pupil shaping unit for receiving light from the assigned light source and for generating a predeterminable basic light distribution in a pupil plane of the illumination system, and a transmission filter assigned to the pupil shaping unit and having at least one array of individually drivable individual elements for the spatially resolving transmission filtering of the light impinging on the transmission filter in or in proximity to a pupil plane of the illumination system. The transmission filter generates a predetermined correction of the basic light distribution. An illumination system of this type can generate a multiplicity of location-dependent intensity distributions in a pupil plane of the illumination system, and ensure a high transmittance.

    摘要翻译： 用于利用来自分配的光源的光照射照明场的微光刻投影曝光装置的照明系统包括：光瞳成形单元，用于从所分配的光源接收光，并且用于在照明的光瞳平面中产生可预定的基本光分布 系统和分配给光瞳整形单元的传输滤波器，并且具有至少一个独立驱动的单独元件阵列，用于在照明系统的光瞳平面内或附近照射在透射滤光片上的光的空间分辨透射滤波。 发送滤波器生成基本配光的预定校正。 这种类型的照明系统可以在照明系统的光瞳平面中产生多个位置相关的强度分布，并确保高透射率。