发明申请
US20050242706A1 Cathode substrate for electron emission device, electron emission device, and method of manufacturing the same
审中-公开
用于电子发射器件的阴极衬底，电子发射器件及其制造方法
- 专利标题： Cathode substrate for electron emission device, electron emission device, and method of manufacturing the same
- 专利标题（中）： 用于电子发射器件的阴极衬底，电子发射器件及其制造方法
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申请号： US11117564申请日： 2005-04-29
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公开(公告)号： US20050242706A1公开(公告)日： 2005-11-03
- 发明人: You-Jong Kim , Chun-Gyoo Lee , Sang-Jo Lee
- 申请人： You-Jong Kim , Chun-Gyoo Lee , Sang-Jo Lee
- 优先权： KR10-2004-0029987 20040429
- 主分类号： H01J29/04
- IPC分类号： H01J29/04 ; H01J1/30 ; H01J1/304 ; H01J1/316 ; H01J9/02 ; H01J29/48 ; H01J31/12 ; H01J1/02
摘要：
A cathode substrate for an electron emission device includes a substrate, electron emission regions formed on the substrate, and one or more driving electrodes controlling the electrons emitted from the electron emission regions. A first insulating layer contacts the driving electrodes. A focusing electrode is provided in the cathode substrate to focus the electrons emitted from the electron emission regions. A second insulating layer is located between the driving electrodes and the focusing electrode. The materials used in the first and the second insulating layers have different etch rates.
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