发明申请
US20050245036A1 Reducing gate dielectric material to form a metal gate electrode extension 有权
减少栅介质材料形成金属栅电极延伸

Reducing gate dielectric material to form a metal gate electrode extension
摘要:
In a metal gate replacement process, a cup-shaped gate metal oxide dielectric may have vertical portions that may be exposed to a reduction reaction. As a result of the reduction reaction, the vertical portions may be converted to metal, which adds to the existing gate electrode. In some cases, removing the vertical dielectric portions reduces fringe capacitance and may also advantageously slightly increased underdiffusion without adding heat, in some embodiments.
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