发明申请
- 专利标题： Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semicoductor device, display device, and method for producing the semiconductor device and the display device
- 专利标题（中）： 正性感光性树脂组合物，图案形成树脂膜的制造方法，半导体装置，显示装置以及半导体装置及显示装置的制造方法
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申请号： US11175813申请日： 2005-07-06
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公开(公告)号： US20050266334A1公开(公告)日： 2005-12-01
- 发明人: Toshio Banba , Takuji Ikeda , Tatsuya Yano , Takashi Hirano
- 申请人： Toshio Banba , Takuji Ikeda , Tatsuya Yano , Takashi Hirano
- 优先权： JP2003-178408 20030623; JP2003-367316 20031028
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/022 ; G03F7/023 ; G03F7/075 ; G03C5/18
摘要：
A positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a compound (C) which contains a —CH20H group but not a phenolic hydroxyl group, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device. Also, disclosed is a positive-working photosensitive resin composition containing an alkali soluble resin (A), a diazoquinone compound (B) and a mixture solvent of two or more kinds (D), wherein the mixture solvent (D) contains γ-butyrolactone and propylene glycol monoalkyl ether and the total amount of γ-butyrolactone and propylene glycol monoalkyl ether is about 70 wt % or more of the total amount of solvent, a method for producing a pattern-formed resin film using the composition, a semiconductor device and a display device using the composition, and a method for producing the semiconductor device and the display device.
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