Invention Application
- Patent Title: Method of making photolithographically-patterned out-of-plane coil structures
- Patent Title (中): 制造光刻图案的平面外线圈结构的方法
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Application No.: US11197675Application Date: 2005-08-04
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Publication No.: US20050270135A1Publication Date: 2005-12-08
- Inventor: Christopher Chua , Francesco Lemmi , Koenraad Van Schuylenbergh , Jeng Lu , David Fork , Eric Peeters , Decai Sun , Donald Smith , Linda Romano
- Applicant: Christopher Chua , Francesco Lemmi , Koenraad Van Schuylenbergh , Jeng Lu , David Fork , Eric Peeters , Decai Sun , Donald Smith , Linda Romano
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Main IPC: H01F41/04
- IPC: H01F41/04 ; G01R1/067 ; G01R3/00 ; G03C5/00 ; H01F17/00 ; H01F17/02 ; H01F27/29 ; H01L21/02 ; H01L21/60 ; H01L21/768 ; H01L23/485 ; H01L23/49 ; H01L23/498 ; H01L23/522 ; H01R9/03 ; H05K7/02

Abstract:
An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate plane without requiring high aspect ratio processing. The photolithographically patterned coil structure includes an elastic member having an intrinsic stress profile. The intrinsic stress profile biases a free portion away from the substrate forming a loop winding. An anchor portion remains fixed to the substrate. The free portion end becomes a second anchor portion which may be connected to the substrate via soldering or plating. A series of individual coil structures can be joined via their anchor portions to form inductors and transformers.
Public/Granted literature
- US07284324B2 Method of making photolithographically-patterned out-of-plane coil structures Public/Granted day:2007-10-23
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