发明申请
- 专利标题: Field emission display and fabrication method
- 专利标题(中): 场发射显示和制造方法
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申请号: US11207896申请日: 2005-08-22
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公开(公告)号: US20050275338A1公开(公告)日: 2005-12-15
- 发明人: Chun-Tao Lee , Ming-Chun Hsiao , Wei-Yi Lin , Yu-Yang Chang , Yu-Wu Wang
- 申请人: Chun-Tao Lee , Ming-Chun Hsiao , Wei-Yi Lin , Yu-Yang Chang , Yu-Wu Wang
- 申请人地址: TW Hsinchu
- 专利权人: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
- 当前专利权人地址: TW Hsinchu
- 优先权: TW092112272 20030506
- 主分类号: H01J9/24
- IPC分类号: H01J9/24 ; H01J9/02 ; H01J9/18 ; H01J29/02 ; H01J29/46 ; H01J29/87 ; H01J31/12 ; H01J1/62 ; H01J63/04
摘要:
A field emission display (FED) having a grid plate with spacer structure and fabrication method thereof. A first plate having first electrodes and electron emitters on a first surface is provided. A second plate having second electrodes and phosphor regions on a second surface is also provided, wherein the second surface is opposite the first surface. A grid plate with spacer structure and passages having grid electrodes is positioned between the two plates to maintain a predetermined interval. When a specific voltage is applied between the first electrode and the second electrode, electrons extracted from the electron emitters are accelerated by the grid electrodes through the passages to impact the phosphor regions.
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