发明申请
- 专利标题: Radiation-emitting semiconductor element and method for producing the same
- 专利标题(中): 辐射发射半导体元件及其制造方法
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申请号: US11065769申请日: 2005-02-25
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公开(公告)号: US20060011925A1公开(公告)日: 2006-01-19
- 发明人: Stefan Bader , Berthold Hahn , Volker Harle , Hans-Jurgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- 申请人: Stefan Bader , Berthold Hahn , Volker Harle , Hans-Jurgen Lugauer , Manfred Mundbrod-Vangerow , Dominik Eisert
- 专利权人: Osram GmbH, a Germany corporation
- 当前专利权人: Osram GmbH, a Germany corporation
- 优先权: DE10020464.3 20000426; DE10026255.4 20000526; DE10051465.0 20001017
- 主分类号: H01L29/22
- IPC分类号: H01L29/22
摘要:
This invention describes a radiation-emitting semiconductor component based on GaN, whose semiconductor body is made up of a stack of different GaN semiconductor layers (1). The semiconductor body has a first principal surface (3) and a second principal surface (4), with the radiation produced being emitted through the first principal surface (3) and with a reflector (6) being produced on the second principal surface (4). The invention also describes a production method for a semiconductor component pursuant to the invention. An interlayer (9) is first applied to a substrate (8), and a plurality of GaN layers (1) that constitute the semiconductor body of the component are then applied to this. The substrate (8) and the interlayer (9) are then detached and a reflector (6) is produced on a principal surface of the semiconductor body.
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