发明申请
- 专利标题： Composition for restoring damaged skin
- 专利标题（中）： 用于恢复受损皮肤的组合物
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申请号： US10533659申请日： 2003-11-10
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公开(公告)号： US20060034945A1公开(公告)日： 2006-02-16
- 发明人: Masahiro Nishimura , Shihomi Nito , Toshio Inagi , Takahito Kimura
- 申请人： Masahiro Nishimura , Shihomi Nito , Toshio Inagi , Takahito Kimura
- 申请人地址： JP Aichi 930-0982 JP Toyama 930-0982
- 专利权人： Kowa Co., Ltd,Teika Pharmaceutical Co., Ltd.
- 当前专利权人： Kowa Co., Ltd,Teika Pharmaceutical Co., Ltd.
- 当前专利权人地址： JP Aichi 930-0982 JP Toyama 930-0982
- 优先权： JP2002-326535 20021111
- 国际申请： PCT/JP03/14251 WO 20031110
- 主分类号： A61K33/36
- IPC分类号： A61K33/36 ; A61K31/685 ; A61K31/7012
摘要：
The present invention provides a composition for repairing injured skin containing saccharide and povidone-iodine of the present invention having characteristices of suppressing time-dependent increase of consistency, easy to use, soft preparation, and superior applicability to a deep wounded lesion and a granulation tissue. The composition for repairing injured skin comprises 50 to 90% by weight of saccharide, 0.5 to 10% by weight of povidone-iodine, 0.1 to 20% by weight of water and 0.01 to 10% by weight of phospholipid.
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