发明申请
US20060131554A1 Nonvolatile memory device having two or more resistance elements and methods of forming and using the same
有权
具有两个或多个电阻元件的非易失性存储器件及其形成和使用方法
- 专利标题: Nonvolatile memory device having two or more resistance elements and methods of forming and using the same
- 专利标题(中): 具有两个或多个电阻元件的非易失性存储器件及其形成和使用方法
-
申请号: US11312744申请日: 2005-12-21
-
公开(公告)号: US20060131554A1公开(公告)日: 2006-06-22
- 发明人: Young-Soo Joung , Yoon-Dong Park , In-Kyeong Yoo , Myoung-Jae Lee , Sun-Ae Seo , Hye-Young Kim , Seung-Eon Ahn , David Seo
- 申请人: Young-Soo Joung , Yoon-Dong Park , In-Kyeong Yoo , Myoung-Jae Lee , Sun-Ae Seo , Hye-Young Kim , Seung-Eon Ahn , David Seo
- 优先权: KR10-2004-0109268 20041221
- 主分类号: H01L29/02
- IPC分类号: H01L29/02
摘要:
A nonvolatile memory device having two or more resistors and methods of forming and using the same. A nonvolatile memory device having two resistance layers, and more particularly, to a nonvolatile memory device formed and operated using a resistance layer having memory switching characteristics and a resistance layer having threshold switching characteristics. The nonvolatile semiconductor memory device may include a lower electrode; a first resistance layer having at least two resistance characteristics formed on the lower electrode, a second resistance layer having threshold switching characteristics formed on the first resistance layer, and an upper electrode formed on the second resistance layer.
公开/授权文献
信息查询
IPC分类: