发明申请
- 专利标题: Metal mask and manufacturing method thereof
- 专利标题(中): 金属掩模及其制造方法
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申请号: US11292760申请日: 2005-12-01
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公开(公告)号: US20060204904A1公开(公告)日: 2006-09-14
- 发明人: Kiyoshi Ogawa
- 申请人: Kiyoshi Ogawa
- 专利权人: Eastman Kodak Company
- 当前专利权人: Eastman Kodak Company
- 优先权: JP2000-292914 20000926; WOPCT/JP01/08309 20010925
- 主分类号: G03C5/04
- IPC分类号: G03C5/04 ; C23C16/00
摘要:
A method for manufacturing a metal mask that facilitates easy dimensional control in the manufacturing process and can manufacture multiple metal masks having high and consistent precision. A Cr film 2 having a mask pattern 2a is formed on the surface of a glass plate 1, a dry film 4 is formed on the Cr film 2, the dry film 4 is exposed from the glass plate 1 side with the Cr film 2 as a mask, a mask pattern 4a having the same shape as that of the mask pattern 2a is formed on the dry film 4, and a metal plating layer 6 is formed on the Cr film 2. The metal plating layer 6 is separated to form a metal mask 7.