发明申请
- 专利标题: Electrochemical processing cell
- 专利标题(中): 电化学处理池
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申请号: US11473295申请日: 2006-06-22
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公开(公告)号: US20060237307A1公开(公告)日: 2006-10-26
- 发明人: Michael Yang , Dmitry Lubomirsky , Yezdi Dord , Saravjeet Singh , Sheshraj Tulshibagwale , Nicolay Kovarsky
- 申请人: Michael Yang , Dmitry Lubomirsky , Yezdi Dord , Saravjeet Singh , Sheshraj Tulshibagwale , Nicolay Kovarsky
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 主分类号: C25B11/00
- IPC分类号: C25B11/00
摘要:
Embodiments of the invention may generally provide a small volume electrochemical plating cell. The plating cell generally includes a fluid basin configured to contain a plating solution therein, the fluid basin having a substantially horizontal weir. The cell further includes an anode positioned in a lower portion of the fluid basin, the anode having a plurality of parallel channels formed therethrough, and a base member configured to receive the anode, the base member having a plurality of groves formed into an anode receiving surface, each of the plurality of grooves terminating into an annular drain channel. A membrane support assembly configured to position a membrane immediately above the anode in a substantially planar orientation with respect to the anode surface is provided, the membrane support assembly having a plurality of channels and bores formed therein.
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