发明申请
US20060256309A1 Lithographic apparatus and device manufacturing method 有权
平版印刷设备和器件制造方法

Lithographic apparatus and device manufacturing method
摘要:
An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
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