发明申请
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US11485958申请日: 2006-07-14
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公开(公告)号: US20060256309A1公开(公告)日: 2006-11-16
- 发明人: Cheng-Qun Gui , Pieter de Jager
- 申请人: Cheng-Qun Gui , Pieter de Jager
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherland B.V.
- 当前专利权人: ASML Netherland B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B27/52
- IPC分类号: G03B27/52
摘要:
An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.
公开/授权文献
- US07324186B2 Lithographic apparatus and device manufacturing method 公开/授权日:2008-01-29
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