公开(公告)号：US20050275840A1

公开(公告)日：2005-12-15

申请号：US10854770

申请日：2004-05-27

申请人： Cheng-Qun Gui ,  Fransiscus Bijnen ,  Johan Hoefnagels ,  Pieter de Jager ,  Joannes de Smit

发明人： Cheng-Qun Gui ,  Fransiscus Bijnen ,  Johan Hoefnagels ,  Pieter de Jager ,  Joannes de Smit

IPC分类号： G01B11/00 ,  G01B11/14 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F7/70275 ,  G03F9/7088

摘要： An optical position assessment apparatus and method has an illumination system that supplies an alignment beam of radiation, and positional data is derived from reflections of the alignment beam. A substrate is supported on a substrate table and a projection system is used to project the alignment beam onto a target portion of the substrate. A positioning system causes relative movement between the substrate and the projection system. An array of lenses is arranged such that each lens in the array focuses a respective portion of the alignment beam onto a respective part of the target portion. An array of detectors is arranged such that each detector in the array detects light reflected from the substrate through a respective lens in the array and provides an output representative of the intensity of light reflected to it from the substrate through the respective lens. A processor is connected to the outputs of the detectors for deriving data representing the position of the lens array relative to the substrate from the outputs of the detectors.

摘要翻译： 光学位置评估装置和方法具有照射系统，其提供对准的辐射束，并且位置数据源自对准光束的反射。 基板被支撑在基板台上，并且使用投影系统将对准光束投影到基板的目标部分上。 定位系统引起基板和投影系统之间的相对移动。 透镜阵列被布置成使得阵列中的每个透镜将对准光束的相应部分聚焦到目标部分的相应部分上。 一组检测器被布置成使得阵列中的每个检测器通过阵列中的相应透镜来检测从基板反射的光，并且通过相应的透镜提供代表从基板反射的光的强度的输出。 处理器连接到检测器的输出，用于从检测器的输出导出表示透镜阵列相对于基板的位置的数据。

公开(公告)号：US20050195380A1

公开(公告)日：2005-09-08

申请号：US10790257

申请日：2004-03-02

申请人： Joost Sytsma ,  Pieter de Jager

发明人： Joost Sytsma ,  Pieter de Jager

IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/52

CPC分类号： G03F7/70558 ,  G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

摘要： A detector, feedback and compensation system for use with a radiation distribution system for distributing the radiation from a radiation system to two or more arrays of individually controllable elements, each for patterning beams of radiation, which are subsequently projected onto a substrate. The detector determines the radiation lost in the radiation distribution system and feeds this information back to a compensation system, which compensates for the loss and keeps the radiation projected onto the substrate uniform.

摘要翻译： 一种用于辐射分布系统的检测器，反馈和补偿系统，用于将辐射系统的辐射分配到两个或更多个独立可控元件的阵列，每个用于构图辐射束，其随后投射到衬底上。 检测器确定辐射分布系统中的辐射损失，并将该信息反馈给补偿系统，补偿系统补偿损耗并保持投射到基板上的辐射均匀。

公开(公告)号：US20050186509A1

公开(公告)日：2005-08-25

申请号：US11091905

申请日：2005-03-29

申请人： Johannes Gijsbertsen ,  Pieter De Jager ,  Michiel Nijkerk

发明人： Johannes Gijsbertsen ,  Pieter De Jager ,  Michiel Nijkerk

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03C5/00 ,  H01L21/311

CPC分类号： G03F9/7053

摘要： A lithographic projection apparatus includes an alignment sensor having an electron beam source constructed and arranged to provide an electron beam for impinging on an alignment marker on a substrate, and a back-scattered electron detector constructed and arranged to detect electrons back-scattered from the alignment marker. The alignment sensor is independent of the projection system and projection radiation, and is an off-axis alignment sensor.

摘要翻译： 光刻投影装置包括一个对准传感器，该对准传感器具有一个电子束源，该电子束源被构造和布置成提供一个电子束，用于冲击基板上的一个对准标记;以及一个后向散射电子检测器，被构造和布置成检测从该对准反向散射的电子 标记。 对准传感器与投影系统和投射辐射无关，是离轴对准传感器。

公开(公告)号：US20070206172A1

公开(公告)日：2007-09-06

申请号：US11717174

申请日：2007-03-13

申请人： Cheng-Qun Gui ,  Arno Bleeker ,  Pieter De Jager ,  Joost Sytsma

发明人： Cheng-Qun Gui ,  Arno Bleeker ,  Pieter De Jager ,  Joost Sytsma

IPC分类号： G03B27/72

CPC分类号： G03F7/70208 ,  G03F7/70275 ,  G03F7/70283 ,  G03F7/70291

摘要： Provided is a radiation distribution system for distributing the radiation from an illumination system to two or more patterning means, each for patterning beams of radiation, which are subsequently projected onto a substrate.

公开(公告)号：US20060139745A1

公开(公告)日：2006-06-29

申请号：US11019672

申请日：2004-12-23

申请人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert Harned ,  Nora-Jean Harned

发明人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert Harned ,  Nora-Jean Harned

IPC分类号： G02B7/182

CPC分类号： G03F7/70275 ,  G02B17/002 ,  G02B17/008 ,  G02B17/0812 ,  G03F7/70233

摘要： A projection system for a lithographic apparatus having a plurality of mirror imaging systems. In an embodiment, the mirror imaging systems are arranged in two rows with each row being perpendicular to a scanning direction of the projection system. Each mirror imaging systems has an associated imaging field. The mirror imaging systems are arranged in a manner that precludes gaps between adjacent imaging fields in the scanning direction. Each mirror imaging system includes a concave mirror and a convex mirror arranged concentrically with the concave mirror. The concave mirrors have a first mirror portion and a second mirror portion that are independently movable. In one embodiment, each of the mirror imaging systems has an associated phase, and the mirror imaging systems in one row are positioned 180 degrees out of phase with the mirror imaging systems in the other row.

摘要翻译： 一种用于具有多个镜像成像系统的光刻设备的投影系统。 在一个实施例中，镜像成像系统布置成两行，每行垂直于投影系统的扫描方向。 每个镜像成像系统都具有相关的成像领域。 镜像成像系统以排除扫描方向上的相邻成像场之间的间隙的方式排列。 每个镜像成像系统包括与凹面镜同心地布置的凹面镜和凸面镜。 凹面镜具有可独立移动的第一反射镜部分和第二反射镜部分。 在一个实施例中，每个镜像成像系统具有相关联的相位，并且一行中的镜像成像系统与另一行中的镜像成像系统定位成180度异相。

公开(公告)号：US20060139609A1

公开(公告)日：2006-06-29

申请号：US11023628

申请日：2004-12-29

申请人： Johannes Baselmans ,  Anastasius Bruinsma ,  Pieter De Jager ,  Robert-Han Munnig Schmidt ,  Henri Vink

发明人： Johannes Baselmans ,  Anastasius Bruinsma ,  Pieter De Jager ,  Robert-Han Munnig Schmidt ,  Henri Vink

IPC分类号： G03B27/72

CPC分类号： G03F7/7005

摘要： A lithographic illumination apparatus and method includes receiving a plurality of source radiation beams from a plurality of corresponding radiation sources, deflecting the plurality of source radiation beams along a common beam path, thereby generating a projection beam of radiation, imparting the projection beam of radiation with a cross-section pattern, and projecting the patterned projection beam of radiation onto a target portion of a substrate.

摘要翻译： 光刻照明装置和方法包括从多个对应的辐射源接收多个源辐射束，沿着公共光束路径偏转多个源辐射束，从而产生投影辐射束，将辐射束投射到 横截面图案，以及将图案化的投影辐射束投影到基板的目标部分上。

公开(公告)号：US20060132750A1

公开(公告)日：2006-06-22

申请号：US11018927

申请日：2004-12-22

申请人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert-Han Munnig Schmidt

发明人： Cheng-Qun Gui ,  Pieter De Jager ,  Robert-Han Munnig Schmidt

IPC分类号： G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70275 ,  G03F7/70308

摘要： A lithographic apparatus comprises an illumination system for supplying a beam of radiation, a patterning arrangement incorporating an array of individually controllable elements for imparting a pattern to the beam cross-section, a substrate table for supporting a substrate, and a projection system incorporating a microlens array for projecting the beam onto a target portion of the substrate. An error compensator is provided for supplying error correction values for compensating for the effect of positional errors in the microlens array, and a grey scale modulator is provided for supplying drive signals to controllable elements of the patterning arrangement in dependence on the error correction values in order to compensate for the effect of positional errors in the microlens array by varying the intensity of some parts of the pattern relative to other parts of the pattern.

公开(公告)号：US20070242253A1

公开(公告)日：2007-10-18

申请号：US11403194

申请日：2006-04-13

申请人： Huibert Visser ,  Johannes Baselmans ,  Pieter De Jager ,  Henri Vink

发明人： Huibert Visser ,  Johannes Baselmans ,  Pieter De Jager ,  Henri Vink

IPC分类号： G03B27/54

CPC分类号： G03F7/70058

摘要： A system and method are used to form incoherent beams from at least a partially coherent beam, such that interference or speckle patterns are substantially eliminated. A rotating optical element directs the partially coherent beam to reflect from an angular distribution changing element to form an incoherent beam. The partially coherent beam can be directed at valying angles or positions onto the angular distribution changing element through rotation of the rotating optical element. The angles can vary as a function of time.

摘要翻译： 系统和方法用于从至少部分相干光束形成非相干光束，从而基本上消除了干涉或散斑图案。 旋转光学元件引导部分相干光束从角分布变化元件反射以形成非相干光束。 通过旋转光学元件的旋转，部分相干光束可以以角度或位置指向角度分布变化元件。 角度可以随着时间的变化而变化。

公开(公告)号：US20060209313A1

公开(公告)日：2006-09-21

申请号：US11084866

申请日：2005-03-21

申请人： Theodorus Van Den Akker ,  Martinus Hendricus Hoeks ,  Pieter De Jager ,  Lambertus Kessels ,  Marco Martinus Van Hassel ,  Frank Morselt

发明人： Theodorus Van Den Akker ,  Martinus Hendricus Hoeks ,  Pieter De Jager ,  Lambertus Kessels ,  Marco Martinus Van Hassel ,  Frank Morselt

IPC分类号： G06F3/12

CPC分类号： G03F7/70291 ,  G03F7/70508

摘要： A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.

摘要翻译： 用于对被配置为赋予光束的图案的独立可控元件的阵列的编程的方法和装置。 例如，该方法可适用于光刻设备。 该方法包括产生表示第一图案的第一数据，产生表示第二图案的第二数据，将第一数据写入第一缓冲器，以及从第一缓冲器读取第一数据以对独立可控元件阵列进行编程以显示第一图案 同时将第二数据并行地写入第二缓冲器。

公开(公告)号：US20060098175A1

公开(公告)日：2006-05-11

申请号：US10983336

申请日：2004-11-08

申请人： Pieter De Jager ,  Cheng-Qun Gui ,  Jacob Klinkhamer ,  Eduard Hoeberichts

发明人： Pieter De Jager ,  Cheng-Qun Gui ,  Jacob Klinkhamer ,  Eduard Hoeberichts

IPC分类号： G03B27/00

CPC分类号： G03F7/70475 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70358

摘要： A lithographic apparatus and method for exposing a substrate. An illumination system supplies a series of beams of radiation that are patterned by an array of individually controllable elements. The patterned beams are projected through arrays of lenses onto target portions of a substrate. Each lens in the arrays directs a respective part of the patterned beam towards the substrate. A displacement system causes relative displacement between the substrate and the beam, such that the beams are scanned across the substrate in a predetermined scanning direction. The projection systems are positioned so that each beam is scanned along a respective one of a series of tracks on the substrate. The tracks overlap so that each track comprises a first portion that is scanned by one beam and at least one second portion that overlaps an adjacent track, and is scanned by two beams. A maximum intensity of a first part of each beam directed towards a first portion of the track can be greater than a maximum intensity of a second part of that beam directed towards a second portion of the track, such that the first and second portions of the track are exposed to radiation of substantially the same maximum intensity. Such overlapping of adjacent beams and modulation of the intensity of the beams can allow the optical footprints of different optical columns to be seamed together to enable exposure of large area substrates in a single scan.

摘要翻译： 一种用于曝光衬底的光刻设备和方法。 照明系统提供一系列由单独可控元件的阵列构图的辐射束。 图案化的光束通过透镜阵列投射到基板的目标部分上。 阵列中的每个透镜将图案化束的相应部分朝向衬底引导。 位移系统引起衬底和梁之间的相对位移，使得束在预定扫描方向上跨过衬底扫描。 投影系统被定位成使得每个光束沿着衬底上的一系列轨道中的相应一个被扫描。 轨道重叠，使得每个轨道包括由一个梁扫描的第一部分和与相邻轨道重叠的至少一个第二部分，并且被两个梁扫描。 朝向轨道的第一部分的每个光束的第一部分的最大强度可以大于朝向轨道的第二部分的该光束的第二部分的最大强度，使得第一部分和第二部分 轨道暴露于基本上相同的最大强度的辐射。 相邻光束的这种重叠和光束强度的调制可以允许将不同光学柱的光学覆盖区缝合在一起以使得能够在单次扫描中暴露大面积的基板。