- 专利标题: Oxidative chemical vapor deposition of electrically conductive and electrochromic polymers
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申请号: US11141353申请日: 2005-05-31
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公开(公告)号: US20060269664A1公开(公告)日: 2006-11-30
- 发明人: Karen Gleason , John Lock
- 申请人: Karen Gleason , John Lock
- 申请人地址: US MA Cambridge
- 专利权人: Massachusetts Institute of Technology
- 当前专利权人: Massachusetts Institute of Technology
- 当前专利权人地址: US MA Cambridge
- 主分类号: C23C16/00
- IPC分类号: C23C16/00
摘要:
Remarkably, disclosed herein is a solvent-less chemical vapor deposition (CVD) method for the oxidative polymerization and deposition of thin films of electrically-conducting polymers. In a preferred embodiment, the method provides poly-3,4-ethylenedioxythiophene (PEDOT) thin films. In other embodiments, the method is applicable to polymerization to give other conducting polymers, such as polyanilines, polypyrroles, polythiophenes and their derivatives. The all-vapor technique uses a moderate substrate temperature, making it compatible with a range of materials, including as fabric and paper. In addition, this method allows for the coating of high surface-area substrates with fibrous, porous and/or particulate morphologies. The coated substrates may be used in organic semiconductor devices, including organic light-emitting diodes (OLEDs), photovoltaics, electrochromics, and supercapacitors.
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