发明申请
- 专利标题： Lithographic apparatus and device manufacturing method
- 专利标题（中）： 平版印刷设备和器件制造方法
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申请号： US11593041申请日： 2006-11-06
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公开(公告)号： US20070046919A1公开(公告)日： 2007-03-01
- 发明人: Cheng-Qun Gui , Arno Bleeker , Pieter Willem De Jager
- 申请人： Cheng-Qun Gui , Arno Bleeker , Pieter Willem De Jager
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G03B27/54
- IPC分类号： G03B27/54
摘要：
Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
公开/授权文献
- US07522266B2 Lithographic apparatus and device manufacturing method 公开/授权日：2009-04-21