利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

5 条记录 (耗时 0.02 秒)

    Lithographic apparatus and device manufacturing method
    2.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070109510A1

    公开(公告)日：2007-05-17

    申请号：US11647426

    申请日：2006-12-29

    申请人： Pieter Willem De Jager ,  Cheng-Qun Gui ,  Peter Spit ,  Eduard Hoeberichts

    发明人： Pieter Willem De Jager ,  Cheng-Qun Gui ,  Peter Spit ,  Eduard Hoeberichts

    IPC分类号： G03B27/52

    CPC分类号： G03F7/70275 ,  G03F7/70291 ,  G03F7/70916 ,  G03F7/70983

    摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.

    摘要翻译： 一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。 投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。 位移系统导致透镜阵列和基板之间的位移。 颗粒检测器检测正在接近透镜阵列的基板上的颗粒。 响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。 当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。 因此可以避免对透镜阵列的损坏。

    Lithographic apparatus and device manufacturing method
    3.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号：US20070052943A1

    公开(公告)日：2007-03-08

    申请号：US11598791

    申请日：2006-11-14

    申请人： Pieter Willem De Jager

    发明人： Pieter Willem De Jager

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70291 ,  G03F7/70275 ,  Y10S359/904

    摘要： A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the beam passing through the pupil is adjusted. In one example, the individually controllable elements are arranged in groups, such that radiation deflected by each element in one group is directed towards the same lens in the lens array. In one example, the individually controllable elements in any one group are controlled together to direct radiation in different directions away from the pupil, such that the pattern imparted to the beam by that group of elements is substantially symmetrical with respect to the pupil.

    摘要翻译： 光刻设备和方法包括提供辐射束的照明系统，对光束进行图案化的独立可控元件阵列;以及投影系统，其将图案化光束引导到支撑在衬底台上的衬底。 投影系统定义了一个瞳孔。 单独可控元件的瞳孔或阵列被成像到基底的目标部分上。 投影系统包括透镜阵列，阵列中的每个透镜被布置成将图案化束的相应部分引导到基板的目标部分的相应部分上。 在一个示例中，每个可独立控制的元件是可选择性地控制的，以将光束的相应部分引导远离光瞳，使得通过光瞳的光束的比例被调节。 在一个示例中，单独可控元件被分组地布置，使得由一组中的每个元件偏转的辐射被引向透镜阵列中的相同透镜。 在一个示例中，任何一个组中的独立可控元件被一起控制以将辐射指向远离光瞳的不同方向，使得由该组元件赋予光束的图案相对于瞳孔基本对称。