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公开(公告)号：US20070052943A1
公开(公告)日：2007-03-08
申请号：US11598791
申请日：2006-11-14
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , Y10S359/904
摘要： A lithographic apparatus and method include an illumination system that supplies a beam of radiation, an array of individually controllable elements that pattern the beam, and a projection system that directs the patterned beam a substrate supported on a substrate table. The projection system defines a pupil. Either the pupil or the array of individually controllable elements is imaged onto a target portion of the substrate. The projection system includes an array of lenses with each lens in the array arranged to direct a respective part of the patterned beam onto a respective part of the target portion of the substrate. In one example, each of the individually controllable elements is selectively controllable to direct a respective part of the beam away from the pupil such that the proportion of the beam passing through the pupil is adjusted. In one example, the individually controllable elements are arranged in groups, such that radiation deflected by each element in one group is directed towards the same lens in the lens array. In one example, the individually controllable elements in any one group are controlled together to direct radiation in different directions away from the pupil, such that the pattern imparted to the beam by that group of elements is substantially symmetrical with respect to the pupil.
摘要翻译： 光刻设备和方法包括提供辐射束的照明系统，对光束进行图案化的独立可控元件阵列;以及投影系统，其将图案化光束引导到支撑在衬底台上的衬底。 投影系统定义了一个瞳孔。 单独可控元件的瞳孔或阵列被成像到基底的目标部分上。 投影系统包括透镜阵列，阵列中的每个透镜被布置成将图案化束的相应部分引导到基板的目标部分的相应部分上。 在一个示例中，每个可独立控制的元件是可选择性地控制的，以将光束的相应部分引导远离光瞳，使得通过光瞳的光束的比例被调节。 在一个示例中，单独可控元件被分组地布置，使得由一组中的每个元件偏转的辐射被引向透镜阵列中的相同透镜。 在一个示例中，任何一个组中的独立可控元件被一起控制以将辐射指向远离光瞳的不同方向，使得由该组元件赋予光束的图案相对于瞳孔基本对称。
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公开(公告)号：US20070026325A1
公开(公告)日：2007-02-01
申请号：US11192400
申请日：2005-07-29
CPC分类号： G03F7/70291 , G03F7/70508 , G03F7/70783 , G03F7/70791
摘要： A distortion measurement apparatus comprising a detector arranged to measure distortion of a substrate, and a processor arranged to receive distortion data indicating the measured distortion of the substrate and to transform the distortion data into a frequency domain representation. The distortion data may alternatively be transformed into an orthogonal polynomial or an orthonormal polynomial representation.
摘要翻译： 一种失真测量装置，包括被布置为测量衬底的失真的检测器，以及被配置为接收指示所测量的衬底的失真的失真数据并将失真数据变换为频域表示的处理器。 可以将失真数据变换为正交多项式或正交多项式表示。
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公开(公告)号：US20070109510A1
公开(公告)日：2007-05-17
申请号：US11647426
申请日：2006-12-29
IPC分类号： G03B27/52
CPC分类号： G03F7/70275 , G03F7/70291 , G03F7/70916 , G03F7/70983
摘要： A lithographic apparatus and method in which an illumination system supplies a projection beam, a patterning system imparts to the beam a pattern in its cross section, and a projection system projects the patterned beam onto a target portion of a substrate. The projection system comprises an array of lenses spaced from the substrate such that each lens in the array focuses part of the patterned beam onto the substrate. A displacement system causes displacement between the lens array and the substrate. A particle detector detects particles on the substrate which are approaching the lens array. A free working distance control system increases the spacing between the lens array and the substrate in response to detection of a particle. The lens array is moved away from the substrate as the detected particle passes the lens array. Thus damage to the lens array can be avoided.
摘要翻译： 一种光刻设备和方法，其中照明系统提供投影光束，图案化系统在其横截面中赋予光束图案，并且投影系统将图案化的光束投射到基板的目标部分上。 投影系统包括与衬底间隔开的透镜阵列，使得阵列中的每个透镜将图案化束的一部分聚焦到衬底上。 位移系统导致透镜阵列和基板之间的位移。 颗粒检测器检测正在接近透镜阵列的基板上的颗粒。 响应于颗粒的检测，自由工作距离控制系统增加了透镜阵列和基板之间的间隔。 当检测到的颗粒通过透镜阵列时，透镜阵列移动离开基板。 因此可以避免对透镜阵列的损坏。
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4.发明申请Lithographic apparatus and device manufacturing method utilizing dynamic correction for magnification and position in maskless lithography 有权平版印刷设备和设备制造方法利用无掩模光刻术中的放大和位置的动态校正公开(公告)号：US20060215142A1
公开(公告)日：2006-09-28
申请号：US11089539
申请日：2005-03-25
申请人： Pieter Willem De Jager , Theodorus Van Den Akker , Willem Venema , Wouter Mulckhuyse , Lambertus Gerardus Kessels
发明人： Pieter Willem De Jager , Theodorus Van Den Akker , Willem Venema , Wouter Mulckhuyse , Lambertus Gerardus Kessels
IPC分类号： G03B27/72
CPC分类号： G03F7/70291 , G03F7/70508
摘要： A lithographic apparatus in which a size and/or a position of features formed on a substrate are adjusted by adjusting an intensity of radiation at boundaries of pattern features.
摘要翻译： 其中通过调节图案特征边界处的辐射强度来调节形成在基底上的特征的尺寸和/或位置的光刻设备。
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公开(公告)号：US20070046919A1
公开(公告)日：2007-03-01
申请号：US11593041
申请日：2006-11-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70275 , G03F7/70283 , G03F7/70291 , G03F7/70308
摘要： Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
摘要翻译： 提供了一种用于促进使用多个可单独控制的元件来调制在聚焦元件阵列的每个聚焦元件处接收的辐射强度的方法和系统，以控制在其上聚焦的基底上的区域中的辐射强度 元素引导辐射。
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公开(公告)号：US20050190354A1
公开(公告)日：2005-09-01
申请号：US10788256
申请日：2004-02-27
IPC分类号： G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70283 , G03F7/70291
摘要： A diffractive optical MEMS device includes a plurality of parallel planar reflective surfaces and an actuator system. The actuator system is used to adjust the position of each of the planar reflectors in a direction perpendicular to the planar reflectors to change characteristics (e.g., phase, intensity, etc.) of light interacting with the device.
摘要翻译： 衍射光学MEMS器件包括多个平行的平面反射表面和致动器系统。 致动器系统用于在与平面反射器垂直的方向上调整每个平面反射器的位置，以改变与该装置相互作用的光的特性（例如，相位，强度等）。
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