发明申请
US20070061036A1 Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus 有权
估算抛光轮廓或抛光量的方法,抛光方法和抛光装置

Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus
摘要:
A polishing method can automatically reset polishing conditions according to a state of a polishing member based on data on a polishing profile changing with time, thereby extending life of the polishing member and obtaining flatness of a polished surface with higher accuracy. The polishing method, includes steps of: independently applying a desired pressure by each of pressing portions of a top ring on a polishing object; estimating a polishing profile of the polishing object based on set pressure values, and calculating a recommended polishing pressure value so that a difference between the polishing profile of the polishing object after it is polished under certain polishing conditions and a desired polishing profile becomes smaller; and polishing the polishing object with the recommended polishing pressure value.
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