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公开(公告)号：US11274446B2
公开(公告)日：2022-03-15
申请号：US16279390
申请日：2019-02-19
申请人： Akira Fukuda
发明人： Kozo Wakiyama , Keiji Hirai , Akira Fukuda
摘要： A threaded reinforcing bar coupling structure comprises a pair of reinforcing bars and a tubular coupler connecting the pair of reinforcing bars. Each of the reinforcing bars is a deformed reinforcing bar having spiral node portions on an outer periphery of a reinforcing bar main body having a round shaft shape. A cylindrical portion with node portions removed is formed on an end portion of the reinforcing bar, and a male threaded portion is formed on the cylindrical portion. The male threaded portion has hardness or tensile strength greater than that of a remaining portion of the reinforcing bar. The pair of reinforcing bars is connected by the screw tubular coupler that is screwed onto the male threaded portions.
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公开(公告)号：US07976358B2
公开(公告)日：2011-07-12
申请号：US12613044
申请日：2009-11-05
CPC分类号： B24B37/005
摘要： A polishing apparatus polishes wafers at a high yield rate even if roll-off exists. The polishing apparatus polishes a wafer by applying a pressure between a polishing member (polishing pad) and the wafer held by a holding member (top ring) and moving the polishing member relative to the wafer. The polishing apparatus includes a top ring for holding the wafer, a pressure adjusting mechanism for adjusting a supporting pressure with which the wafer is supported on a supporting surface by a retainer ring, and a control unit for controlling the pressure adjusting mechanism to bring the supporting pressure to a desired pressure based on a roll off quantity of the wafer. The top ring comprises an air bag for pressing the wafer against the polishing pad, a retainer ring which surrounds the wafer, and an air bag for pressing the retainer ring.
摘要翻译： 即使存在滚降，抛光装置以高屈服率抛光晶片。 抛光装置通过在抛光构件（抛光垫）和由保持构件（顶环）保持的晶片之间施加压力并且相对于晶片移动抛光构件来抛光晶片。 抛光装置包括用于保持晶片的顶环，用于调节通过保持环将晶片支撑在支撑表面上的支撑压力的压力调节机构，以及用于控制压力调节机构以使支撑 基于晶片的滚降量将压力压到所需的压力。 顶环包括用于将晶片压靠在抛光垫上的气囊，围绕晶片的保持环和用于按压保持环的气囊。
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公开(公告)号：US20100076588A1
公开(公告)日：2010-03-25
申请号：US12613044
申请日：2009-11-05
CPC分类号： B24B37/005
摘要： A polishing apparatus is provided for polishing wafers at a high yield rate even if roll-off exists. The polishing apparatus polishes a wafer W by applying a pressure between a polishing member (polishing pad) 201 and the wafer W held by a holding member (top ring) 52 and relatively moving the polishing member 201 to the wafer W. The polishing apparatus comprises a top ring 52 for holding the wafer W, a pressure adjusting mechanism 206 for adjusting a supporting pressure with which the wafer W is supported on a supporting surface by a retainer ring 203, and a control unit 208 for controlling the pressure adjusting mechanism 206 to bring the supporting pressure to a desired pressure based on a roll off quantity of the wafer W. The top ring 52 comprises an air bag 202 for pressing the wafer W against the polishing pad 201, a retainer ring 203 which surrounds the wafer W, and an air bag 204 for pressing the retainer ring 203.
摘要翻译： 提供抛光装置用于以高屈服率抛光晶片，即使存在滚降。 抛光装置通过在抛光构件（抛光垫）201和由保持构件（顶环））52保持的晶片W之间施加压力并将抛光构件201相对移动到晶片W来对晶片W进行抛光。抛光装置包括 用于保持晶片W的顶环52，用于调节通过保持环203将晶片W支撑在支撑表面上的支撑压力的压力调节机构206以及用于将压力调节机构206控制到 基于晶片W的滚降量将支撑压力提高到期望的压力。顶环52包括用于将晶片W压靠在抛光垫201上的气囊202，围绕晶片W的保持环203和 用于按压保持环203的气囊204。
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公开(公告)号：US20080176008A1
公开(公告)日：2008-07-24
申请号：US12010181
申请日：2008-01-22
申请人： Xinming Wang , Akira Owatari , Takashi Koba , Tsutomu Nakada , Akira Fukuda
发明人： Xinming Wang , Akira Owatari , Takashi Koba , Tsutomu Nakada , Akira Fukuda
IPC分类号： H01F10/08
CPC分类号： H01F41/24 , C23C18/161 , C23C18/1673 , C23C18/1879 , C23C18/36
摘要： A magnetic film forming apparatus can form a magnetic film, especially a magnetic alloy film, selectively on a metal surface exposed on a surface of a substrate, such as a semiconductor wafer. The magnetic film forming apparatus comprises an electroless plating apparatus having a magnetic field generation apparatus for generating a magnetic field around and parallel to a substrate disposed such that the surface of the substrate is in contact with a plating solution in a plating tank.
摘要翻译： 磁性膜形成装置可以在暴露在诸如半导体晶片的基板的表面上的金属表面上选择性地形成磁性膜，特别是磁性合金膜。 磁性膜形成装置包括具有磁场产生装置的化学镀设备，用于产生围绕并平行于基板的磁场，该基板设置成使得基板的表面与电镀槽中的镀液接触。
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公开(公告)号：US20070232203A1
公开(公告)日：2007-10-04
申请号：US11730141
申请日：2007-03-29
申请人： Akira Fukuda , Hirokuni Hiyama , Manabu Tsujimura
发明人： Akira Fukuda , Hirokuni Hiyama , Manabu Tsujimura
IPC分类号： B24B1/00
CPC分类号： B24B53/017 , B08B1/04 , B08B3/02 , H01L21/67219
摘要： A polishing method can prevent scratches in a polished surface of a polishing object, caused by foreign matter adhering to a surface of a polishing member, thus preventing the attendant lowering of the yield even when the polishing object is large-sized. The polishing method includes: specifying a foreign matter adhesion position or a foreign matter adhesion area in a surface of the polishing member; and intensively cleaning the foreign matter adhesion position or the foreign matter adhesion area in the surface of the polishing member.
摘要翻译： 抛光方法可以防止抛光对象的抛光表面由于抛光构件的表面附着的异物引起的划痕，从而即使在抛光对象大的情况下也能防止随之降低的成品率。 抛光方法包括：指定抛光构件的表面中的异物粘附位置或异物粘附区域; 并且强烈地清洗抛光部件的表面中的异物附着位置或异物粘附区域。
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公开(公告)号：US07034285B2
公开(公告)日：2006-04-25
申请号：US10797723
申请日：2004-03-11
申请人： Katsunori Ichiki , Akio Shibata , Akira Fukuda , Hirokuni Hiyama , Kazuo Yamauchi , Seiji Samukawa
发明人： Katsunori Ichiki , Akio Shibata , Akira Fukuda , Hirokuni Hiyama , Kazuo Yamauchi , Seiji Samukawa
IPC分类号： H05H3/02
摘要： A beam source has a plasma generating chamber and a gas inlet port for introducing a gas into the plasma generating chamber. The beam source includes a plasma generator for generating positive-negative ion plasma containing positive ions at a density of at least 1010 ions/cm3 and negative ions from the gas. The beam source also includes a plasma potential adjustment electrode disposed in the plasma generating chamber and a grid electrode having a plurality of beam extraction holes formed therein. The beam extraction holes have a diameter of at least 0.5 mm. The beam source has a first power supply for applying a voltage of at most 500 V between the plasma potential adjustment electrode and the grid electrode.
摘要翻译： 光束源具有等离子体产生室和用于将气体引入等离子体产生室的气体入口端口。 光束源包括等离子体发生器，用于产生具有至少10×10 5 / cm 3的密度的正离子和来自气体的负离子。 光束源还包括设置在等离子体发生室中的等离子体电位调节电极和形成有多个光束提取孔的栅格电极。 光束提取孔的直径至少为0.5mm。 光束源具有用于在等离子体电位调节电极和栅电极之间施加至多500V的电压的第一电源。
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公开(公告)号：US6100599A
公开(公告)日：2000-08-08
申请号：US232473
申请日：1999-01-15
申请人： Toshifumi Kouchi , Akira Fukuda
发明人： Toshifumi Kouchi , Akira Fukuda
CPC分类号： F02B63/04 , F02B75/16 , F02B77/11 , F02B2063/046 , F02B2075/027 , F02B63/048 , F05C2201/021
摘要： A portable generator includes a metal shroud surrounding at least a crankcase and a cylinder block of an engine. The engine is directly mounted to the shroud. The shroud forms an effective radiating element and gives an additional heat-radiating surface to the engine, thereby increasing the heat radiation capacity of the engine. Heat generated from the engine while running can, therefore, be radiated efficiently. The shroud is mounted within a sound insulating case, so that the portable generator has a double sound-insulating structure. The noise-proofing property of the portable generator is, therefore, very high.
摘要翻译： 便携式发电机包括至少围绕发动机的曲轴箱和汽缸体的金属罩。 发动机直接安装在护罩上。 护罩形成有效的辐射元件，并向发动机提供额外的散热表面，从而增加发动机的散热能力。 因此，可以有效地辐射发动机在运转时产生的热量。 护罩安装在隔音箱内，使得便携式发电机具有双重隔音结构。 因此，便携式发电机的防噪音性能非常高。
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公开(公告)号：US4993256A
公开(公告)日：1991-02-19
申请号：US340469
申请日：1989-04-19
申请人： Akira Fukuda
发明人： Akira Fukuda
IPC分类号： G01M3/32
CPC分类号： G01M3/3236
摘要： In order to accurately conduct a leakage test in a short time, an initial pressure higher than a test pressure is first supplied into a hollow object to be tested. Then, part of the pressure within the object is relieved to decrease the temperature within the object to the ambient temperature so that the pressure within the object can be stabilized at the test pressure. Then, a variation in the pressure within the object is detected to determine whether there is any leakage in the object. In the case where a negative pressure is utilized, an initial pressure lower than the test pressure is first supplied into the object, and then part of the pressure within the object is relieved by introducing the ambient air into the object, to increase the temperature within the object to the ambient temperature so that the pressure within the object can be stabilized at the test pressure. Then, a variation in the pressure within the object is detected to determine whether there is any leakage in the object.
摘要翻译： 为了在短时间内精确地进行泄漏试验，首先将高于试验压力的初始压力供给到待测试的中空物体中。 然后，减轻物体内的一部分压力以将物体内的温度降低到环境温度，使得物体内的压力可以在测试压力下稳定。 然后，检测物体内的压力变化，以确定物体中是否有泄漏。 在使用负压的情况下，首先将低于试验压力的初始压力供给到物体中，然后通过将环境空气引入到物体中来减轻物体内的一部分压力，以增加物体内的温度 对象到环境温度，使得物体内的压力可以在测试压力下稳定。 然后，检测物体内的压力变化，以确定物体中是否有泄漏。
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9.发明授权
公开(公告)号：US4040525A
公开(公告)日：1977-08-09
申请号：US695962
申请日：1976-06-14
申请人： Koichi Tokunaga , Akira Fukuda
发明人： Koichi Tokunaga , Akira Fukuda
摘要： A method and apparatus for grouping metal ingots of predetermined shape into ingot groups each consisting of four ingots and stacking these ingot groups in tiers to form a stack. In the method and apparatus, two kinds of ingot groups of different patterns are automatically alternately stacked in tiers utilizing the movement of a conveyor conveying the ingots, so that dangerous relative sliding movement of the ingots in the stack may not occur during transportation.
摘要翻译： 一种用于将预定形状的金属锭分组成锭组的方法和装置，每个锭组由四个锭组成，并以层叠的方式堆叠这些锭组以形成一个叠层。 在该方法和装置中，利用输送锭的输送机的运动，使用不同图案的两种锭组自动交替堆叠，从而在运输过程中可能不会发生堆中的锭的危险的相对滑动运动。
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10.发明申请公开(公告)号：US20100081361A1
公开(公告)日：2010-04-01
申请号：US12566224
申请日：2009-09-24
CPC分类号： B24B53/017
摘要： A method of dressing a polishing member with a diamond dresser having diamond particles arranged on a surface thereof is provided. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the dressing conditions determined. The simulation includes calculation of the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.
摘要翻译： 提供了一种用金刚石修整器修整抛光构件的方法，其具有布置在其表面上的金刚石颗粒。 该方法包括通过对抛光构件的表面上的金刚石修整器的滑动距离的分布进行模拟来确定修整条件，以及在确定的修整条件下用金刚石修整器修整抛光构件。 模拟包括根据推入抛光构件的金刚石颗粒的深度校正的滑动距离的计算。
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