发明申请
- 专利标题： Method of forming patterns using imprint material
- 专利标题（中）： 使用压印材料形成图案的方法
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申请号： US11520023申请日： 2006-09-13
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公开(公告)号： US20070065588A1公开(公告)日： 2007-03-22
- 发明人: Naoko Kihara , Yoshiyuki Kamata , Satoshi Shirotori , Katsuyuki Naito
- 申请人： Naoko Kihara , Yoshiyuki Kamata , Satoshi Shirotori , Katsuyuki Naito
- 申请人地址： JP Tokyo
- 专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人： KABUSHIKI KAISHA TOSHIBA
- 当前专利权人地址： JP Tokyo
- 优先权： JP2005-270148 20050916
- 主分类号： B05D3/12
- IPC分类号： B05D3/12 ; B05D3/02 ; B29C71/02
摘要：
A method of forming patterns includes coating a toroidal substrate having a center hole with an imprint material containing a precursor of a metal oxide film, selected from the group consisting of a metal alkoxide and a metal oxide, and an ether type nonionic surfactant containing fluorine or silicon, imprinting a stamper on the imprint material to transfer patterns of protrusions and recesses of the stamper to the imprint material, and removing organic components from the imprint material through plasma processing or heat treatment to form a metal oxide film having patterns of protrusions and recesses.
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