公开(公告)号：US20070065588A1

公开(公告)日：2007-03-22

申请号：US11520023

申请日：2006-09-13

申请人： Naoko Kihara ,  Yoshiyuki Kamata ,  Satoshi Shirotori ,  Katsuyuki Naito

发明人： Naoko Kihara ,  Yoshiyuki Kamata ,  Satoshi Shirotori ,  Katsuyuki Naito

IPC分类号： B05D3/12 ,  B05D3/02 ,  B29C71/02

CPC分类号： G11B5/855

摘要： A method of forming patterns includes coating a toroidal substrate having a center hole with an imprint material containing a precursor of a metal oxide film, selected from the group consisting of a metal alkoxide and a metal oxide, and an ether type nonionic surfactant containing fluorine or silicon, imprinting a stamper on the imprint material to transfer patterns of protrusions and recesses of the stamper to the imprint material, and removing organic components from the imprint material through plasma processing or heat treatment to form a metal oxide film having patterns of protrusions and recesses.

摘要翻译： 形成图案的方法包括用具有中心孔的环形基板涂覆含有金属氧化物膜的前体的压印材料，所述金属氧化物膜的前体选自金属醇盐和金属氧化物，以及含有氟的醚型非离子表面活性剂 硅，在压印材料上压印压模以将压模的突起和凹陷的图案转印到压印材料，以及通过等离子体处理或热处理从压印材料中去除有机组分以形成具有突起和凹陷图案的金属氧化物膜 。

公开(公告)号：US20070172584A1

公开(公告)日：2007-07-26

申请号：US11657720

申请日：2007-01-25

申请人： Naoko Kihara ,  Satoshi Shirotori ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

发明人： Naoko Kihara ,  Satoshi Shirotori ,  Yoshiyuki Kamata ,  Masatoshi Sakurai

IPC分类号： B05D5/12

CPC分类号： G11B5/855

摘要： A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.

摘要翻译： 图案化磁记录介质的制造方法包括：通过用电磁辐射或电子束分解的抗蚀剂涂覆磁性膜以具有低分子量，通过压印方法在抗蚀剂上形成图案，转印图案 通过使用其上形成有图案的抗蚀剂作为掩模，并且通过将抗蚀剂暴露于电磁辐射或电子束来除去抗蚀剂到磁性膜。

公开(公告)号：US07635529B2

公开(公告)日：2009-12-22

申请号：US11475862

申请日：2006-06-28

申请人： Katsuyuki Naito ,  Masatoshi Sakurai ,  Akira Kikitsu ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Masahiro Oka

发明人： Katsuyuki Naito ,  Masatoshi Sakurai ,  Akira Kikitsu ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Masahiro Oka

IPC分类号： G11B5/71 ,  G11B5/82

CPC分类号： G11B5/7315

摘要： According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.

摘要翻译： 根据一个实施例，用于磁记录介质的基底具有对应于记录轨迹的周向突起和对应于记录轨道之间的凹槽的周向凹部，其中满足以下条件中的至少一个的基底：（a）凹部的表面具有 表面能小于突起的表面能，（b）凹部的表面用可热分解或可变形的物质进行改性，（c）凹陷表面的表面粗糙度小于突起的表面粗糙度，（d）晶体 在凹部的表面上比在突起上的取向更加干扰，（e）凹部的表面用引起与磁性材料反应或扩散到磁性材料中的物质进行改性，和（f） 该凹部用可溶于溶剂或可变形物质的物质进行改性。

公开(公告)号：US20070003798A1

公开(公告)日：2007-01-04

申请号：US11475862

申请日：2006-06-28

申请人： Katsuyuki Naito ,  Masatoshi Sakurai ,  Akira Kikitsu ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Masahiro Oka

发明人： Katsuyuki Naito ,  Masatoshi Sakurai ,  Akira Kikitsu ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Masahiro Oka

IPC分类号： G11B5/706

CPC分类号： G11B5/7315

摘要： According to one embodiment, a substrate for a magnetic recording media has circumferential protrusions corresponding to recording tracks and circumferential recesses corresponding to grooves between the recording tracks, in which the substrate satisfying at least one of conditions of (a) a surface of the recess has a surface energy smaller than that of the protrusion, (b) the surface of the recess is modified with a thermally decomposable or deformable substance, (c) the surface of the recess has surface roughness smaller than that of the protrusion, (d) crystal orientation is more disturbed on the surface of the recess than on the protrusion, (e) the surface of the recess is modified with a substance that causes reaction with a magnetic material or that diffuses into the magnetic material, and (f) the surface of the recess is modified with a substance soluble in a solvent or with a deformable substance.

摘要翻译： 根据一个实施例，用于磁记录介质的基底具有对应于记录轨迹的周向突起和对应于记录轨道之间的凹槽的周向凹部，其中满足以下条件中的至少一个的基底：（a）凹部的表面具有 表面能小于突起的表面能，（b）凹部的表面用可热分解或可变形的物质进行改性，（c）凹陷表面的表面粗糙度小于突起的表面粗糙度，（d）晶体 在凹部的表面上比在突起上的取向更加干扰，（e）凹部的表面用引起与磁性材料反应或扩散到磁性材料中的物质进行改性，和（f） 该凹部用可溶于溶剂或可变形物质的物质进行改性。

公开(公告)号：US20060078681A1

公开(公告)日：2006-04-13

申请号：US11248587

申请日：2005-10-13

申请人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

发明人： Hiroyuki Hieda ,  Naoko Kihara ,  Katsuyuki Naito

IPC分类号： B05D3/04 ,  B05D5/12 ,  B05D3/02

CPC分类号： G11B5/855

摘要： The present invention provides a pattern forming method using phase separation structure of self-assembling block copolymer and minimizing variations in pattern. A substrate having groove structure pre-formed thereon, is coated with a solution of the block copolymer comprising at least one block having a mesogen group. The block copolymer is caused to self-assemble in the groove to form block copolymer assemblies, which are regularly arrayed. The invention also relates to a processing method of processing a substrate by the use of the pattern obtained by the pattern forming method as a template.

公开(公告)号：US08956560B2

公开(公告)日：2015-02-17

申请号：US13423543

申请日：2012-03-19

申请人： Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

发明人： Yasuaki Ootera ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Yoshiaki Kawamonzen ,  Takeshi Okino ,  Ryosuke Yamamoto ,  Tomoyuki Maeda ,  Norikatsu Sasao ,  Akiko Yuzawa ,  Takuya Shimada ,  Hiroyuki Hieda

IPC分类号： H01L21/00 ,  B29C33/38 ,  G11B5/855

CPC分类号： B29C33/3857 ,  G11B5/855

摘要： In one embodiment, a method of manufacturing a mold includes: forming a first layer having an affinity to a second polymer on a substrate having an affinity to a first polymer; forming first and second openings in the first layer; filling a resist in the second openings and hardening the resist to obtain a hardened resist; and forming a second layer containing a block copolymer and causing it to self-assemble.

摘要翻译： 在一个实施方案中，制造模具的方法包括：在对第一聚合物具有亲和性的基材上形成对第二聚合物具有亲和性的第一层; 在第一层中形成第一和第二开口; 在第二开口中填充抗蚀剂并使抗蚀剂硬化以获得硬化抗蚀剂; 并形成含有嵌段共聚物并使其自组装的第二层。

公开(公告)号：US08916053B2

公开(公告)日：2014-12-23

申请号：US13528348

申请日：2012-06-20

申请人： Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

发明人： Yoshiaki Kawamonzen ,  Yasuaki Ootera ,  Akiko Yuzawa ,  Naoko Kihara ,  Yoshiyuki Kamata ,  Hiroyuki Hieda ,  Norikatsu Sasao ,  Ryosuke Yamamoto ,  Takeshi Okino ,  Tomoyuki Maeda ,  Takuya Shimada

IPC分类号： C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  B44C3/08 ,  B44C5/04 ,  B81C1/00 ,  B44C1/22 ,  H01L21/033 ,  G03F7/00 ,  B41M5/00

CPC分类号： B44C1/227 ,  B41M5/00 ,  B81C1/0046 ,  B81C2201/0153 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337 ,  Y10T156/1041

摘要： A pattern forming method according to an embodiment includes: forming a pattern film on a first substrate, the pattern film having a concave-convex pattern, the pattern film being made of a material containing a first to-be-imprinted agent; forming a material film on a second substrate, the material film containing a second to-be-imprinted agent having a higher etching rate than an etching rate of the first to-be-imprinted agent; transferring the concave-convex pattern of the pattern film onto the material film by applying pressure between the first substrate and the second substrate, with the pattern film being positioned to face the material film, and by curing the second to-be-imprinted agent; detaching the first substrate from the pattern film; and removing the material film by etching, to leave the pattern film on the second substrate.

摘要翻译： 根据实施例的图案形成方法包括：在第一基板上形成图案膜，所述图案膜具有凹凸图案，所述图案膜由包含第一待打印剂的材料制成; 在第二基板上形成材料膜，所述材料膜含有蚀刻速率高于第一待打印剂的蚀刻速率的第二待定印剂; 通过在第一基板和第二基板之间施加压力将图案膜的凹凸图案转印到材料膜上，图案膜定位成面对材料膜，并且通过固化第二待打印剂; 从图案膜分离第一衬底; 并通过蚀刻去除材料膜，以将图案膜留在第二基板上。

公开(公告)号：US20120067843A1

公开(公告)日：2012-03-22

申请号：US13064301

申请日：2011-03-16

申请人： Akira Watanabe ,  Kaori Kimura ,  Yousuke Isowaki ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Akira Kikitsu

发明人： Akira Watanabe ,  Kaori Kimura ,  Yousuke Isowaki ,  Yoshiyuki Kamata ,  Naoko Kihara ,  Akira Kikitsu

IPC分类号： C23F1/02

CPC分类号： H01L21/3086 ,  B82Y10/00 ,  G03F7/0002 ,  G03F7/165 ,  G03F7/168 ,  G11B5/743 ,  G11B5/82 ,  G11B5/855 ,  H01L21/0332 ,  H01L21/0337 ,  H01L21/3081

摘要： A method of forming a fine pattern according to an embodiment includes: forming a hard mask on a substrate; forming a mask reinforcing member on the hard mask; forming a di-block copolymer layer on the mask reinforcing member, the di-block copolymer layer comprising a sea-island structure; forming a pattern comprising a concave-convex structure in the di-block copolymer layer, with island portions of the sea-island structure being convex portions; and transferring the pattern onto the hard mask by performing etching on the mask reinforcing member and the hard mask, with a mask being the pattern formed in the di-block copolymer layer. The mask reinforcing member is comprised of a material having an etching speed that is higher than an etching speed for the hard mask and is lower than an etching speed for sea portions of the sea-island structure of the di-block copolymer layer.

摘要翻译： 根据实施例的形成精细图案的方法包括：在基底上形成硬掩模; 在所述硬掩模上形成掩模加强部件; 在掩模加强部件上形成二嵌段共聚物层，二嵌段共聚物层包含海岛结构体; 在所述二嵌段共聚物层中形成包括凹凸结构的图案，所述海岛结构的岛部是凸部; 并通过在掩模增强部件和硬掩模上进行蚀刻将图案转印到硬掩模上，其中掩模是在二嵌段共聚物层中形成的图案。 掩模加强部件由蚀刻速度高于硬掩模的蚀刻速度的材料构成，并且低于二嵌段共聚物层的海岛结构的海水部分的蚀刻速度。

公开(公告)号：US06811897B2

公开(公告)日：2004-11-02

申请号：US10395253

申请日：2003-03-25

申请人： Katsuyuki Naito ,  Naoko Kihara ,  Rei Hasegawa ,  Shintaro Enomoto ,  Yutaka Nakai ,  Kazushige Yamamoto ,  Hiroki Iwanaga ,  Kimito Sakai ,  Yasushi Mori

发明人： Katsuyuki Naito ,  Naoko Kihara ,  Rei Hasegawa ,  Shintaro Enomoto ,  Yutaka Nakai ,  Kazushige Yamamoto ,  Hiroki Iwanaga ,  Kimito Sakai ,  Yasushi Mori

IPC分类号： H05B3312

CPC分类号： H05B33/14 ,  C09K11/06 ,  C09K2211/1029 ,  C09K2211/1425 ,  H01L27/3244 ,  H01L51/0005 ,  H01L51/0025 ,  H01L51/0036 ,  H01L51/0037 ,  H01L51/0038 ,  H01L51/0039 ,  H01L51/0062 ,  H01L51/5088 ,  Y10S428/917

摘要： There is disclosed an organic electro luminescence display device comprising a two-dimensional array of pixels comprising organic electro luminescence elements capable of emitting a of color or different plural colors, each of the organic electro luminescence elements being provided with an anode, a cathode, a polymeric luminescence layer located between the anode and the cathode, and a hole injection layer. The hole injection layer is constituted by solid matters containing a donor molecule comprising polythiophene and/or a derivative thereof, and an acceptor molecule comprising polystyrenesulfonic acid and/or a derivative thereof, a concentration of sulfate ion in the hole injection layer is 125 ppm or less, and components having a molecular weight of 110,000 or less is 35% or less based on an entire solid matters, the molecular weight being converted as sodium polystyrenesulfonate in an aqueous gel permeation chromatography measured by using UV of 254 nm in wavelength.

摘要翻译： 公开了一种有机电致发光显示装置，其包括能够发射颜色或不同多种颜色的有机电致发光元件的二维像素阵列，每个有机电致发光元件设置有阳极，阴极， 位于阳极和阴极之间的聚合物发光层和空穴注入层。 空穴注入层由包含聚噻吩和/或其衍生物的供体分子和包含聚苯乙烯磺酸和/或其衍生物的受体分子的固体物质构成，空穴注入层中的硫酸根离子的浓度为125ppm或 更少，分子量为11万以下的成分相对于整个固体成分为35％以下，分子量在通过使用波长为254nm的UV测定的水性凝胶渗透色谱中被转化为聚苯乙烯磺酸钠。

公开(公告)号：US08105952B2

公开(公告)日：2012-01-31

申请号：US12222916

申请日：2008-08-19

申请人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

发明人： Naoko Kihara ,  Hiroyuki Hieda ,  Yoshiyuki Kamata

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： G11B5/82 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855

摘要： A pattern forming method is provided, which includes forming, above a substrate, a layer of a diblock copolymer composition containing at least PS and PEO, subjecting the layer to phase separation to obtain a phase-separated layer, thereby forming an easy-to-etch region constituted by PS and having a cylindrical or lamellar configuration extending in a first direction, forming an imprinting resist layer on the phase-separated layer, subjecting the imprinting resist layer to imprinting to form, on the imprinting resist layer, an uneven pattern consisting of projections and recesses extending in a second direction intersecting with the first direction, selectively removing, from the imprinting resist layer, the recesses, thereby leaving only the projections and, at the same time, selectively removing the PS from the phase-separated layer to obtain an etching resistive pattern containing PEO, and etching the substrate using, as a mask, not only the projections but also the etching resistive pattern.

摘要翻译： 提供了图案形成方法，其包括在基底上形成含有至少PS和PEO的二嵌段共聚物组合物层，使该层相分离以获得相分离层，由此形成易于 蚀刻区域由PS构成并且具有在第一方向上延伸的圆柱形或层状结构，在相分离层上形成刻印抗蚀剂层，使压印抗蚀剂层压印以在压印抗蚀剂层上形成不均匀图案，该不均匀图案包括 在与第一方向相交的第二方向上延伸的突起和凹部，从压印抗蚀剂层选择性地去除凹部，从而仅留下突起，并且同时从相分离层选择性地去除PS 获得含有PEO的蚀刻电阻图案，并且使用不仅突起而且还具有抗蚀刻性，作为掩模来蚀刻基板 ve模式。